1-Methoxy-4-pentylsulfanylnaphthalene

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-Methoxy-4-pentylsulfanylnaphthalene
• 英文别名: 1-methoxy-4-pentylsulfanylnaphthalene
• 化学式: C₁₆H₂₀OS
• 分子量: 260.4
• InChiKey: RWLKJFCEXAAMNJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.4
• 重原子数：
  18
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  34.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME
  申请人：FUJIFILM Corporation

  公开号：US20140295332A1

  公开（公告）日：2014-10-02

  An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160048075A1

  公开（公告）日：2016-02-18

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.
• US9188862B2
  申请人：——

  公开号：US9188862B2

  公开（公告）日：2015-11-17
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT ACTINIQUE, FILM DE PHOTORÉSINE UTILISANT UNE TELLE COMPOSITION, PROCÉDÉ DE FORMATION DE MOTIFS, ET PROCÉDÉ POUR LA FABRICATION DE DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE, ET COMPOSÉ
  申请人：FUJIFILM CORP

  公开号：WO2014034533A1

  公开（公告）日：2014-03-06

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group, R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X- represents a non-nucleophilic anion.