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Ethenylsulfanylethene;3-[4-hydroxy-3-methyl-5-(2-methylpropyl)phenyl]propanoic acid

中文名称
——
中文别名
——
英文名称
Ethenylsulfanylethene;3-[4-hydroxy-3-methyl-5-(2-methylpropyl)phenyl]propanoic acid
英文别名
ethenylsulfanylethene;3-[4-hydroxy-3-methyl-5-(2-methylpropyl)phenyl]propanoic acid
Ethenylsulfanylethene;3-[4-hydroxy-3-methyl-5-(2-methylpropyl)phenyl]propanoic acid化学式
CAS
——
化学式
C32H46O6S
mdl
——
分子量
558.8
InChiKey
SSXIUHDYLKQBDC-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    7.84
  • 重原子数:
    39
  • 可旋转键数:
    12
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.44
  • 拓扑面积:
    140
  • 氢给体数:
    4
  • 氢受体数:
    7

文献信息

  • STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE
    申请人:Cytec Technology Corp.
    公开号:EP2864310A1
    公开(公告)日:2015-04-29
  • STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION
    申请人:Cytec Industries Inc.
    公开号:EP3137540A1
    公开(公告)日:2017-03-08
  • [EN] STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE<br/>[FR] COMPOSITIONS STABILISATRICES CONTENANT DES COMPOSÉS CHROMANNE SUBSTITUÉS ET MÉTHODES D'UTILISATION ASSOCIÉES
    申请人:CYTEC TECH CORP
    公开号:WO2013188490A1
    公开(公告)日:2013-12-19
    Stabilizer compositions having a chroman-based compound according to Formula (V): and their use in processes for stabilizing organic materials subject to degradation and/or discoloration due to the effects from light, oxygen and heat, and in processes for producing articles from organic materials blended therewith, are provided herein.
  • [EN] STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION<br/>[FR] COMPOSITIONS STABILISANTES PERMETTANT DE STABILISER DES MATÉRIAUX CONTRE LA LUMIÈRE ULTRAVIOLETTE ET LA DÉGRADATION THERMIQUE
    申请人:CYTEC IND INC
    公开号:WO2015168389A1
    公开(公告)日:2015-11-05
    Stabilizing compositions for stabilizing materials against degradation due to thermal and ultraviolet light exposure are disclosed herein. In some instances, the stabilizing compositions include an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; a phosphite compound, an acid scavenger and/or thioester; and a hindered phenol antioxidant compound.
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