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1-(2-Naphthalen-2-yloxy-2-oxoethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid

中文名称
——
中文别名
——
英文名称
1-(2-Naphthalen-2-yloxy-2-oxoethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
英文别名
1-(2-naphthalen-2-yloxy-2-oxoethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
1-(2-Naphthalen-2-yloxy-2-oxoethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid化学式
CAS
——
化学式
C20H18O4
mdl
——
分子量
322.4
InChiKey
NGZDGTOJOKHUCR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    24
  • 可旋转键数:
    5
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.3
  • 拓扑面积:
    63.6
  • 氢给体数:
    1
  • 氢受体数:
    4

文献信息

  • RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD
    申请人:Osaku Yumi
    公开号:US20140087136A1
    公开(公告)日:2014-03-27
    A resin composition which contains a binder resin (A), radiation-sensitive compound (B), silane-modified resin (C), and antioxidant (D), wherein a content of the silane-modified resin (C) is 0.1 to 150 parts by weight with respect to 100 parts by weight of the binder resin (A), a content of the antioxidant (D) is 0.1 to 10 parts by weight with respect to 100 parts by weight of the binder resin (A), and an amount of warping is 14 μm or less when using the resin composition to form a thickness 2 to 3 μm resin film and baking the formed resin film at 230° C. is provided.
    一种树脂组合物,包含粘合剂树脂(A),辐射敏感化合物(B),改性树脂(C)和抗氧化剂(D),其中改性树脂(C)的含量相对于100份粘合剂树脂(A)为0.1至150份重量,抗氧化剂(D)的含量相对于100份粘合剂树脂(A)为0.1至10份重量,并且使用该树脂组合物形成2至3μm厚度的树脂膜并在230°C下烘烤形成的树脂膜翘曲量为14μm或以下。
  • RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT
    申请人:Zeon Corporation
    公开号:EP3121651A1
    公开(公告)日:2017-01-25
    A radiation-sensitive resin composition comprising a binder resin (A), a radiation-sensitive compound (B), a tetrafunctional or lower functional epoxy-based cross-linking agent (C) having an epoxy equivalent of 450 or less and a softening point of 30°C or less, and an aralkyl phenol resin (D) is provided. According to the present invention, it is possible to provide a radiation-sensitive resin composition able to give a resin film high in adhesion to a metal layer and excellent in developability and low hygroscopicity.
    本发明提供了一种辐射敏感树脂组合物,该组合物由粘结剂树脂(A)、辐射敏感化合物(B)、环氧当量为 450 或以下且软化点为 30°C 或以下的四官能度或更低官能度环氧基交联剂(C)和芳基苯酚树脂(D)组成。根据本发明,可以提供一种辐射敏感性树脂组合物,该树脂组合物能够生成与属层粘附性高、显影性好和吸湿性低的树脂膜。
  • RESIN COMPOSITION
    申请人:Zeon Corporation
    公开号:EP3345970A1
    公开(公告)日:2018-07-11
    A resin composition comprising a binder resin (A), a phenoxy resin having a hydroxyl equivalent of 300 or more, and a cross-linking agent (C). The resin composition of the present invention preferably further comprises a photoacid generator (D). The photoacid generator (D) is more preferably a quinone diazide compound.
    一种树脂组合物,包括粘合剂树脂 (A)、羟基当量大于等于 300 的苯氧树脂交联剂 (C)。本发明的树脂组合物最好还包括光酸发生器(D)。光酸发生剂(D)最好是重氮化醌化合物。
  • RADIATION SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT
    申请人:Zeon Corporation
    公开号:EP3438746A1
    公开(公告)日:2019-02-06
    A radiation-sensitive resin composition comprising a cyclic olefin polymer (A) having a protonic polar group, a bifunctional epoxy compound (B) represented by the following general formula (1), and a radiation-sensitive compound (C): wherein, in the above general formula (1), R1 is a linear chain or branched alkylene group having 1 to 15 carbon atoms, and "k" is an integer of 1 to 20, is provided.
    一种辐射敏感树脂组合物,由具有质子极性基团的环烯烃聚合物 (A)、由以下通式 (1) 表示的双官能环氧化合物 (B) 和辐射敏感化合物 (C) 组成: 其中,在上述通式(1)中,R1 是具有 1 至 15 个碳原子的直链或支链烯基,"k "是 1 至 20 的整数。
  • INFRARED LED
    申请人:Zeon Corporation
    公开号:EP3486957A1
    公开(公告)日:2019-05-22
    An infrared LED comprising an insulating film formed on an element and a microlens formed on the insulating film, wherein the insulating film and the microlens are formed using radiation-sensitive resin compositions each containing a cyclic olefin polymer (A) having a protonic polar group, a radiation-sensitive compound (B), and a cross-linking agent (C), is provided.
    本发明提供了一种红外发光二极管,包括形成在元件上的绝缘膜和形成在绝缘膜上的微透镜,其中绝缘膜和微透镜是使用辐射敏感树脂组合物形成的,每种组合物都包含具有质子极性基团的环烯烃聚合物(A)、辐射敏感化合物(B)和交联剂(C)。
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