8-Methyl-9-naphthalen-2-yloxynonane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 8-Methyl-9-naphthalen-2-yloxynonane-1-sulfonic acid
• 英文别名: 8-methyl-9-naphthalen-2-yloxynonane-1-sulfonic acid
• 化学式: C₂₀H₂₈O₄S
• 分子量: 364.5
• InChiKey: ZIZZAIMAJWBVHZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.5
• 重原子数：
  25
• 可旋转键数：
  11
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  72
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• Composition and method for the deposition of conductive polymers on dielectric substrates
  申请人：Rasmussen Jean

  公开号：US10021782B2

  公开（公告）日：2018-07-10

  The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions.

  本发明涉及一种在电介质基底上沉积导电聚合物的组合物和工艺。特别是，本发明涉及一种在电介质基底表面形成导电聚合物的组合物，该组合物包括至少一种能够形成导电聚合物的可聚合单体、乳化剂和酸，其特征在于该组合物包括至少一种金属离子，该金属离子选自锂离子、钠离子、铝离子、铍离子、铋离子、硼离子、铟离子和烷基咪唑离子组成的组。
• COMPOSITION AND METHOD FOR THE DEPOSITION OF CONDUCTIVE POLYMERS ON DIELECTRIC SUBSTRATES
  申请人：Rietmann Christian

  公开号：US20140138253A1

  公开（公告）日：2014-05-22

  The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions.
• Compositions Including a High Molecular Weight Acid Suitable for Conductive Polymer Formation on Dielectric Substrate
  申请人：MacDermid Enthone Inc.

  公开号：US20180002541A1

  公开（公告）日：2018-01-04

  The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions. The acid is typically a high molecular weight polymeric acid having molecular weight of at least 500,000 Da including, for example, polystyrene sulfonic acid having a molecular weight of approximately 1,000,000 Da.