7-Ethoxy-1-methoxynaphthalene

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 7-Ethoxy-1-methoxynaphthalene
• 英文别名: 7-ethoxy-1-methoxynaphthalene
• 化学式: C₁₃H₁₄O₂
• 分子量: 202.25
• InChiKey: QRHYHVALQDRHCU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20220214617A1

  公开（公告）日：2022-07-07

  A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); “n” represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, “n”, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film.

  一种用于形成有机薄膜的材料包含(A)通式(1)所示的化合物和/或具有通式(4)所示的重复单元的聚合物，以及(B)有机溶剂。在公式(1)中，AR1、AR2、AR3、AR4、AR5和AR6各代表苯环或萘环；R1代表以下公式(2)中显示的任何基团；“n”表示1或2的整数；W代表具有2-50个碳原子的二价有机基团。在公式(4)中，AR1、AR2、AR3、AR4、AR5、AR6、R1、“n”和W如上所定义；R2和R3各代表氢原子或具有1-20个碳原子的有机基团，并且可选择在分子内彼此结合形成环状有机基团。本发明提供了一种用于形成有机薄膜的材料，以实现高蚀刻抗性和优异的扭曲抗性，而不损害树脂衍生的碳含量；以及适用于形成有机薄膜的化合物和聚合物。
• NOVEL SULFONIUM SALT COMPOUND, METHOD FOR PRODUCING THE SAME, AND PHOTOACID GENERATOR
  申请人：DSP GOKYO FOOD & CHEMICAL CO., LTD.

  公开号：US20150293445A1

  公开（公告）日：2015-10-15

  Provided is a sulfonium salt compound represented by the following general formula (I): where R 1 and R 2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R 3 and R 4 each denote the same or a different alkyl group having 1 to 10 carbon atoms, and X − denotes a sulfone imide anion or a perfluoroalkanesulfonic acid anion, wherein the substituents denoted by R 3 O and R 4 O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group.
• US8952204B2
  申请人：——

  公开号：US8952204B2

  公开（公告）日：2015-02-10
• US9465288B2
  申请人：——

  公开号：US9465288B2

  公开（公告）日：2016-10-11