1-Ethoxy-5-methoxynaphthalene

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-Ethoxy-5-methoxynaphthalene
• 英文别名: 1-ethoxy-5-methoxynaphthalene
• 化学式: C₁₃H₁₄O₂
• 分子量: 202.25
• InChiKey: CVJIFDXVWNDYIX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP4020082A1

  公开（公告）日：2022-06-29

  A material for forming an organic film contains (A) a compound shown by the following general formula (1) and/or a polymer having a repeating unit shown by the following general formula (4), and (B) an organic solvent. In the general formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent a benzene ring or a naphthalene ring; R1 represents any group shown in the following formula (2); "n" represents an integer of 1 or 2; and W represents a divalent organic group having 2 to 50 carbon atoms. In the general formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, "n", and W are as defined above; and R2 and R3 each represent a hydrogen atom or an organic group having 1 to 20 carbon atoms, and optionally bond to each other within a molecule to form a cyclic organic group. An object of the present invention is to provide a material for forming an organic film to enable high etching resistance and excellent twisting resistance without impairing the resin-derived carbon content; and a compound and a polymer suitable for the material for forming an organic film.

  一种用于形成有机薄膜的材料包含(A)下式(1)所示的化合物和/或具有下式(4)所示重复单元的聚合物，以及(B)有机溶剂。在通式（1）中，AR1、AR2、AR3、AR4、AR5 和 AR6 分别代表苯环或萘环；R1 代表下式（2）中所示的任何基团；"n "代表 1 或 2 的整数；W 代表具有 2 至 50 个碳原子的二价有机基团。在通式（4）中，AR1、AR2、AR3、AR4、AR5、AR6、R1、"n "和 W 如上定义；R2 和 R3 分别代表氢原子或具有 1 至 20 个碳原子的有机基团，并可选择在分子内相互键合以形成环状有机基团。本发明的目的是提供一种用于形成有机薄膜的材料，以在不影响树脂衍生碳含量的情况下实现高抗蚀性和优异的抗扭曲性；以及一种适用于该用于形成有机薄膜的材料的化合物和聚合物。
• NOVEL SULFONIUM SALT COMPOUND, METHOD FOR PRODUCING THE SAME, AND PHOTOACID GENERATOR
  申请人：DSP GOKYO FOOD & CHEMICAL CO., LTD.

  公开号：US20150293445A1

  公开（公告）日：2015-10-15

  Provided is a sulfonium salt compound represented by the following general formula (I): where R 1 and R 2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R 3 and R 4 each denote the same or a different alkyl group having 1 to 10 carbon atoms, and X − denotes a sulfone imide anion or a perfluoroalkanesulfonic acid anion, wherein the substituents denoted by R 3 O and R 4 O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group.
• US8952204B2
  申请人：——

  公开号：US8952204B2

  公开（公告）日：2015-02-10
• US9465288B2
  申请人：——

  公开号：US9465288B2

  公开（公告）日：2016-10-11