(1,2,2,3,3-Pentafluorocyclohexyl)methyl 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: (1,2,2,3,3-Pentafluorocyclohexyl)methyl 2-methylprop-2-enoate
• 英文别名: (1,2,2,3,3-pentafluorocyclohexyl)methyl 2-methylprop-2-enoate
• 化学式: C₁₁H₁₃F₅O₂
• 分子量: 272.21
• InChiKey: PKTNRWWXRGAYMW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  7

文献信息

• FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20140162190A1

  公开（公告）日：2014-06-12

  A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.
• US9213236B2
  申请人：——

  公开号：US9213236B2

  公开（公告）日：2015-12-15
• US9500950B2
  申请人：——

  公开号：US9500950B2

  公开（公告）日：2016-11-22