1-Ethyl-3-methylpyridin-1-ium;1,1,2,2,3,3,3-heptafluoropropane-1-sulfonate

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 1-Ethyl-3-methylpyridin-1-ium;1,1,2,2,3,3,3-heptafluoropropane-1-sulfonate
• 英文别名: 1-ethyl-3-methylpyridin-1-ium;1,1,2,2,3,3,3-heptafluoropropane-1-sulfonate
• 化学式: C11H12F7NO3S
• 分子量: 371.27
• InChiKey: SXELCQXUCANLMJ-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.62
• 重原子数：
  23
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.55
• 拓扑面积：
  69.5
• 氢给体数：
  0
• 氢受体数：
  10

文献信息

• HEAT-SHIELDING HEAT INSULATING SUBSTRATE
  申请人：Nitto Denko Corporation

  公开号：EP3604887A1

  公开（公告）日：2020-02-05

  Provided is a heat-shielding heat insulating substrate that is excellent not only in scratch resistance on the surface of a protective film but also in scratch resistance of an outermost layer after the peeling of the protective film. The heat-shielding heat insulating substrate of the present invention is a heat-shielding heat insulating substrate including a transparent substrate layer and an infrared reflection layer, the heat-shielding heat insulating substrate including: a protective topcoat layer arranged on a side of the infrared reflection layer opposite to the transparent substrate layer; and a protective film arranged on a surface of the protective topcoat layer opposite to the infrared reflection layer, wherein a 180° peel strength of the protective film to the protective topcoat layer under an environment having a temperature of 23±1°C and a humidity of 50±5%RH is from 0.01 N/50 mm to 0.40 N/50 mm, and wherein a 180° peel strength of the protective film to the protective topcoat layer after storage of the heat-shielding heat insulating substrate under an environment having a temperature of 80±1°C for 10 days is from 0.01 N/50 mm to 1.0 N/50 mm.

  本发明提供了一种热屏蔽隔热基板，该基板不仅在保护膜表面具有优异的抗划伤性，而且在保护膜剥离后最外层也具有优异的抗划伤性。本发明的热屏蔽隔热基板是一种热屏蔽隔热基板，包括透明基板层和红外线反射层，热屏蔽隔热基板包括：设置在红外反射层与透明基底层相对的一侧上的保护面漆层；以及 设置在保护面漆层与红外反射层相对的表面上的保护膜，其中，在温度为 23±1°C 和湿度为 50±5%RH 的环境下，保护膜与保护面漆层的 180° 剥离强度为 0.01牛顿/50毫米至0.40牛顿/50毫米，其中在温度为80±1℃的环境下将隔热基板存放10天后，保护膜与保护面涂层的180°剥离强度为0.01牛顿/50毫米至1.0牛顿/50毫米。
• REMOVABLE WATER-DISPERSIBLE ACRYLIC PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET
  申请人：NITTO DENKO CORPORATION

  公开号：US20140248490A1

  公开（公告）日：2014-09-04

  Provided is a removable water-dispersible acrylic pressure-sensitive adhesive composition with which it is possible to form a pressure-sensitive adhesive layer that has excellent antistatic properties, adhesive properties, removability, removal stability, and the ability to prevent an increase in adhesive strength over time, less-staining properties on adherends, especially, the ability to prevent white staining on adherends in a high-humidity environment (the ability to prevent white staining), and appearance properties. The present invention is directed to a removable water-dispersible acrylic pressure-sensitive adhesive composition, including: an acrylic emulsion polymer including 70 to 99.5% by weight of a monomer unit derived from an alkyl(meth)acrylate and 0.5 to 10% by weight of a monomer unit derived from a carboxyl group-containing unsaturated monomer; an ionic compound; and a polyether antifoamer represented by formula (I) below. HO—(PO) n1 -(EO) m1 —H  (I) In formula (I), PO represents an oxypropylene group, EO represents an oxyethylene group, m1 represents an integer of 0 to 40, n1 represents an integer of 1 or more, and EO and PO are added in a random form or a block form.
• US20140272408A1
  申请人：——

  公开号：US20140272408A1

  公开（公告）日：2014-09-18
• US20140342152A1
  申请人：——

  公开号：US20140342152A1

  公开（公告）日：2014-11-20
• PHOTOSENSITIVE TRANSFER FILM, MANUFACTURING METHOD OF ANTISTATIC PATTERN, MANUFACTURING METHOD OF PHOTOSENSITIVE TRANSFER FILM, LAMINATE, TOUCH PANEL, MANUFACTURING METHOD OF TOUCH PANEL, AND DISPLAY DEVICE WITH TOUCH PANEL
  申请人：FUJIFILM CORPORATION

  公开号：US20220137513A1

  公开（公告）日：2022-05-05

  Provided are a photosensitive transfer film including, in the following order, a photosensitive layer having a thickness of 10 μm or less and an antistatic layer, in which the photosensitive layer contains an alkali-soluble acrylic resin, a radically polymerizable compound having an ethylenically unsaturated group, and a photopolymerization initiator; and applications thereof.