4-(2,2-Diphenylpropane-4-yloxysulfonyl)naphthoquinone-1,2-diazide

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 4-(2,2-Diphenylpropane-4-yloxysulfonyl)naphthoquinone-1,2-diazide
• 英文别名: [4-(2-phenylpropan-2-yl)phenyl] benzo[g][1,2,3]benzoxadiazole-5-sulfonate
• 化学式: C₂₅H₂₀N₂O₄S
• 分子量: 444.5
• InChiKey: FFCUREHGWOIZMD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.4
• 重原子数：
  32
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  90.7
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20180081270A1

  公开（公告）日：2018-03-22

  A radiation-sensitive composition comprising a resist base material (A), an optically active diazonaphthoquinone compound (B), and a solvent (C), wherein the content of the solvent (C) in the composition is 20 to 99% by mass, the content of components except for the solvent (C) is 1 to 80% by mass, and the resist base material (A) is a compound represented by the following formula (1): wherein R 1 is a 2n-valent group of 1 to 30 carbon atoms; R 2 to R 5 are each independently an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, or a hydroxyl group, wherein at least one of R 4 and/or at least one of R 5 is one or more kinds selected from a hydroxyl group and a thiol group; m 2 and m 3 are each independently an integer of 0 to 8; m 4 and m 5 are each independently an integer of 0 to 9, wherein m 4 and m 5 are not 0 at the same time; n is an integer of 1 to 4; and p 2 to p 5 are each independently an integer of 0 to 2.