Embodiments relate to a polishing composition for a magnetic disk substrate, where the polishing composition contains colloidal silica, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound has a weight average molecular weight of 20,000 to 10,000,000 and a concentration of 0.0001 to 2.0% by mass.
本发明涉及一种用于磁盘基底的抛光组合物,其中抛光组合物包含胶体
二氧化硅、
水溶性聚合物化合物和
水。 根据至少一个实施例,
水溶性聚合物化合物的重量平均分子量为 20,000 至 10,000,000 ,浓度为 0.0001 至 2.0%(质量百分比)。