作者:Wolfram Sander、Anja Strehl、Michael Winkler
DOI:10.1002/1099-0690(200110)2001:20<3771::aid-ejoc3771>3.0.co;2-0
日期:2001.10
of a series of bis(sulfonyl)diazomethanes was investigated in solution and in low temperature matrices. These diazo compounds are of interest as photoacid generators in photoresists for deep UV lithography. Triplet carbenes could be trapped in solution, but attempts to isolate the carbenes in argon matrices at 10 K were unsuccessful, the corresponding sulfenes and other rearranged products being observed
在溶液和低温基质中研究了一系列双(磺酰基)重氮甲烷的光化学。这些重氮化合物在用于深紫外光刻的光刻胶中用作光酸产生剂。三重卡宾可能会被困在溶液中,但试图在 10 K 的氩气基质中分离卡宾没有成功,而是在这些条件下观察到相应的亚砜和其他重排产物。这与 DFT 和 ab initio 计算一致,它们预测单线态卡宾是通往氧杂噻吩氧化物途径的过渡态,可以将其视为分子内稳定的卡宾。三线态卡宾在能量上位于单线态过渡态之上,因此即使在低温基质中也不会具有延长的寿命。