(4-Methoxyphenyl)diphenyl-l4-sulfaneyl 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: (4-Methoxyphenyl)diphenyl-l4-sulfaneyl 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• 英文别名: [(4-methoxyphenyl)-diphenyl-λ4-sulfanyl] 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• 化学式: C₂₃H₁₇F₉O₄S₂
• 分子量: 592.5
• InChiKey: OPSZACNLRHZKST-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.4
• 重原子数：
  38
• 可旋转键数：
  9
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  62
• 氢给体数：
  0
• 氢受体数：
  14

文献信息

• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• Process for producing triarylsulfonium salt
  申请人：Sumino Motoshige

  公开号：US20070083060A1

  公开（公告）日：2007-04-12

  [Subject] To provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. [Means for Solution Problems] The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]: wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, lower haloalkyl group, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a lower haloalkyl group, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]: wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]: RMgX   [2] wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]: HA 1 [3] wherein, A 1 represents the same as above, or a salt thereof.

  [主题] 提供一种有效地生产三芳基硫鎓盐的方法，其结构中阳离子部分的三个芳环中仅有一个芳环与另外两个芳环不同（以下简称与本发明有关的三芳基硫鎓盐），高产率地生产三芳基硫鎓盐而不产生任何副产物。 [解决问题的方法] 本发明涉及一种生产由一般式[4]表示的三芳基硫鎓盐的方法： 其中，两个R1分别代表氢原子、卤素原子、烷基、较低的卤代烷基、烷氧基、酰基、羟基、氨基、硝基或氰基；R代表芳基，该芳基可以具有从卤素原子、烷基、较低的卤代烷基、烷氧基、烷硫基、N-烷基氨甲酰基和氨甲酰基中选择的取代基，上述取代基与上述R1所代表的取代基不同；A1代表强酸残基。 该方法包括在高亲氧活化剂存在下，使一由一般式[1]表示的二芳基亚砜： 其中，R1代表与上述相同，以及由一般式[2]表示的芳基格氏试剂反应： RMgX   [2] 其中，X代表卤素原子；R代表与上述相同，然后将所得反应混合物与一由一般式[3]表示的强酸： HA1[3] 其中，A1代表与上述相同或其盐反应。
• Chemical amplifying type positive resist composition and sulfonium salt
  申请人：Sumitomo Chemical Company, Limited

  公开号：EP1167349A1

  公开（公告）日：2002-01-02

  A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I): wherein Q1 and Q2 is alkyl or a cycloalkyl, or Q1 and Q2 form, together with a sulfur atom to which Q1 and Q2 are adjacent, an heteroalicyclic group; Q3 represents a hydrogen atom, Q4 represents alkyl or a cycloalkyl, or Q3 and Q4 form, together with a CHC(O) group to which Q3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q5SO3- represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb): wherein P1 to P5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P6SO3- and P7SO3- each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.

  一种化学放大型正极抗蚀剂组合物，其抗蚀图案的线边缘粗糙度得到了极大的改善，并且在抗干蚀刻性、灵敏度和分辨率等各种抗蚀性能方面都非常出色；该组合物包括 (A) 酸发生器，其中含有 (a) 下式 (I) 所代表的锍盐： 其中 Q1 和 Q2 是烷基或环烷基，或 Q1 和 Q2 与 Q1 和 Q2 相邻的硫原子一起构成杂环基；Q3 代表氢原子，Q4 代表烷基或环烷基，或 Q3 和 Q4 与 Q3 和 Q4 相邻的 CHC(O) 基一起构成 2-氧代环烷基；以及 Q5SO3- 代表有机磺酸根离子，和 (b) 至少一种鎓盐，选自下式(IIa)代表的三苯基锍盐和下式(IIb)代表的二苯基碘 锍盐： 其中 P1 至 P5 代表氢、羟基、烷基或烷氧基；P6SO3- 和 P7SO3-各自独立地代表有机磺酸根离子；以及 (B) 一种树脂，其聚合单元具有对酸不稳定的基团，本身不溶于碱或微溶于碱，但在酸的作用下转化为溶于碱。
• POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1736827A1

  公开（公告）日：2006-12-27

  The present invention relates to a positive-type resist composition for liquid immersion lithography and a method of forming a resist pattern, in particular, a positive-type resist composition for liquid immersion lithography that exhibits superior liquid immersion resistance to water; and a method for forming a resist pattern by thereof. The positive-type resist composition for liquid immersion lithography according to the present invention includes a resin component (A) increasing alkali-solubility by acid action; and an acid generator generating acid by exposure; in which, the resin component (A) contains at least one acrylic ester constitutional unit (a1), and one (meth)acrylic ester constitutional unit (a2) having acid dissociable, dissolution inhibiting group, and the constitutional unit (a1) consists of a cyclic group bonded to the acrylic ester of the constitutional unit (a1), and a fluoro organic group bonded to the cyclic group.

  本发明涉及一种用于液浸平版印刷的正型抗蚀剂组合物和一种形成抗蚀剂图案的方法，特别是一种用于液浸平版印刷的正型抗蚀剂组合物，该组合物具有优异的耐水液浸性能；以及用其形成抗蚀剂图案的方法。根据本发明，用于液浸平版印刷的正型抗蚀剂组合物包括通过酸作用增加碱溶解性的树脂成分（A）；以及通过曝光产生酸的酸发生器；其中，树脂组分（A）包含至少一个丙烯酸酯组成单元（a1）和一个（甲基）丙烯酸酯组成单元（a2），丙烯酸酯组成单元（a2）具有可酸解的溶解抑制基团，组成单元（a1）由与组成单元（a1）的丙烯酸酯键合的环状基团和与环状基团键合的氟有机基团组成。
• PROCESS FOR PRODUCING FOAM
  申请人：OJI PAPER CO., LTD.

  公开号：EP1795553A1

  公开（公告）日：2007-06-13

  A foam production method including an irradiating step in which an active energy beam is irradiated onto a foamable composition containing an acid generating agent, which generates an acid, or a base generating agent, which generates a base, due to an action of an active energy beam, and containing a compound which has a decomposable/foamable functional group, which decomposes and eliminates one or more kinds of volatile substances with a low boiling point by reacting with the acid or base; and a subsequent foaming step in which the foamable composition is foamed under controlled pressure in a temperature region where the volatile substances with a low boiling point are decomposed and being eliminated.

  一种泡沫生产方法，包括一个辐照步骤，在该步骤中，一束活性能量光束被照射到一种可发泡组合物上，该组合物含有一种酸生成剂，在活性能量光束的作用下生成一种酸，或一种碱生成剂，在活性能量光束的作用下生成一种碱，该组合物还含有一种具有可分解/可发泡官能团的化合物，该化合物通过与酸或碱反应，分解并消除一种或多种具有低沸点的挥发性物质；以及随后的发泡步骤，在该步骤中，可发泡组合物在受控压力下，在低沸点挥发性物质被分解和消除的温度区域内发泡。