申请人:University Of North Carolina At Charlotte
公开号:US20140315130A1
公开(公告)日:2014-10-23
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
本发明提供了用于
化学增强型光刻胶和使用其的光刻工艺的光酸发生剂。