N-butyl-N-methylnaphthalene-1-sulfonamide

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: N-butyl-N-methylnaphthalene-1-sulfonamide
• 化学式: C₁₅H₁₉NO₂S
• 分子量: 277.4
• InChiKey: OLLPZQPYBAVTGI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  45.8
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• RADIATION SENSITIVE COMPOSITION
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20180181000A1

  公开（公告）日：2018-06-28

  A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) R 1 a R 2 b Si(R 3 ) 4-(a+b) Formula (1) wherein R 1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R 3 is a hydrolyzable group; and Formula (2) R 7 c R 8 d Si(R 9 ) 4-(c+d) Formula (2) wherein R 7 is an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R 9 is a hydrolyzable group.