Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
申请人:Central Glass Company, Limited
公开号:US20130130175A1
公开(公告)日:2013-05-23
A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1):
in which R
1
represents a monovalent organic group, and Q
+
represents a sulfonium cation or iodonium cation.
NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
申请人:International Business Machines Corporation
公开号:US20180044459A1
公开(公告)日:2018-02-15
Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.
Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
申请人:KATO Misugi
公开号:US20120322006A1
公开(公告)日:2012-12-20
A sulfonate resin according to the present invention has a repeating unit of the following general formula (3):
where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C
1
-C
3
alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M
+
represents a monovalent cation.
This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.
Polymeric dyes that comprise (a) segments that render the dyes soluble or dispersible in hydrocarbon solvents and (b) segments that impart color. The polymeric dyes can be introduced into hydrocarbon solvents or formed in hydrocarbon solvents to form stable colored dispersions, which can be used as toners for electrophotography. In these toners, the polymeric dye contains macromeric moieties that render the polymeric dye dispersible in hydrocarbon solvents. The polymeric dye may contain either a charge-directing chelating moiety or a surface-release promoting moiety or both of these moieties.
According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3).
In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.