[EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AUX RADIATIONS ACTINIQUES, FILM DE RÉSERVE QUI UTILISE CETTE DERNIÈRE, PROCÉDÉ DE FORMATION DE MOTIFS, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
申请人:FUJIFILM CORP
公开号:WO2013115345A1
公开(公告)日:2013-08-08
There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C): wherein Xa represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, each of R1a, R1b and R1c independently represents an alkyl group or a cycloalkyl group, two members of R1a, R1b and R1c may combine to form a ring structure, Xb1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R2 represents an organic group having one or more CH3 partial structures and being stable to acid, Xb2 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R3 represents an organic group having one or more CH3 partial structures and being stable to acid, and n represents an integer of 1 to 5.