(R,S)-BisPh-mebBox

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: (R,S)-BisPh-mebBox
• 英文别名: 2-[(4,5-diphenyl-4,5-dihydro-1,3-oxazol-2-yl)methyl]-4,5-diphenyl-4,5-dihydro-1,3-oxazole
• 化学式: C₃₁H₂₆N₂O₂
• 分子量: 458.5
• InChiKey: BVEHHQYXICTXGR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6
• 重原子数：
  35
• 可旋转键数：
  6
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.16
• 拓扑面积：
  43.2
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190300498A1

  公开（公告）日：2019-10-03

  A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

  该化合物包括分子中由以下一般式（1-1）所示的两个或更多个部分结构，其中每个Ar独立地表示一个芳香环，可以具有取代基，或者是一个含有至少一个氮原子的芳香环，可以具有取代基，两个Ar可以选择地彼此连接以形成一个环结构；虚线代表与有机基团的键合；B代表一种能够由于热和酸的作用而形成反应性阳离子的阴离子离去基团。这提供了一种能够在空气或惰性气体中的成膜条件下固化而不形成副产物的化合物，并形成具有良好干法刻蚀耐久性的有机底层膜，在衬底加工过程中不仅具有填隙和平坦化在衬底上形成的图案的优异特性。
• Asymmetric copper complex and cyclopropanation reaction using the same
  申请人：——

  公开号：US20020177718A1

  公开（公告）日：2002-11-28

  There are disclosed asymmetric copper complex comprising, as components, (a) an optically active bisoxazoline compound of formula (1): 1 wherein R 1 and R 2 are different and each represent a hydrogen atom, an alkyl group, a cycloalkyl group, or a phenyl or aralkyl group which may be substituted, R 3 and R 4 each represent a hydrogen atom, an alkyl group, a cycloalkyl group, or a phenyl or aralkyl group which may be substituted, or R 3 and R 4 may be bonded to each other to form a C 3-5 cyclic alkylene group, R 5 represents a hydrogen atom or a C 1-6 alkyl group, or the two R 5 groups may be bonded to each other to represent a C 3-5 cyclic alkylene group, (b) a monovalent or divalent copper compound, and (c) a strong acid or a Lewis acid or a mixture thereof, and a process for producing an optically active cyclopropanecarboxylate using the same.

  揭示了包括以下组分的不对称铜络合物：（a）公式（1）的手性双噁唑啉化合物：其中R1和R2不同，每个代表氢原子、烷基、环烷基、苯基或芳基烷基，可能被取代，R3和R4每个代表氢原子、烷基、环烷基、苯基或芳基烷基，可能被取代，或者R3和R4可以相互连接形成C3-5环烷基，R5代表氢原子或C1-6烷基，或者两个R5基团可以相互连接形成C3-5环烷基；（b）一价或二价铜化合物；和（c）强酸或Lewis酸或二者混合物，以及使用它们制备手性环丙烷羧酸酯的方法。
• Compound, method for manufacturing the compound, and composition for forming organic film
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10604618B2

  公开（公告）日：2020-03-31

  A compound includes two or more structures shown by the following general formula (1-1) in the molecule, “Ar” represents an aromatic ring or one that contains at least one nitrogen atom and/or sulfur atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with Y; Y represents a divalent or trivalent organic group having 6 to 30 carbon atoms that contains an aromatic ring or a heteroaromatic ring optionally having a substituent, the bonds of which are located in a structure of the aromatic ring or the heteroaromatic ring; R represents a hydrogen atom or a monovalent group having 1 to 68 carbon atoms. This compound can be cured even in an inert gas not only in air atmosphere without forming byproducts, and can form an organic under layer film.

  一种化合物的分子中包含两个或多个如下通式（1-1）所示的结构、 Ar "代表芳香环或含有至少一个氮原子和/或硫原子（可选择具有取代基）的芳香环，两个 "Ar "可选择相互键合以形成环状结构；断线代表与 Y 的键；Y 代表具有 6 至 30 个碳原子的二价或三价有机基团，含有芳香环或杂芳环（可选择具有取代基），其键位于芳香环或杂芳环的结构中；R 代表氢原子或具有 1 至 68 个碳原子的一价基团。这种化合物不仅可以在空气中固化，甚至可以在惰性气体中固化，而不会产生副产品，并且可以形成一层有机底膜。
• Compound and composition for forming organic film
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US11022882B2

  公开（公告）日：2021-06-01

  A compound shown by the following general formula (1-1), AR1 and AR2 each independently represent an aromatic ring or an aromatic ring containing at least one nitrogen and/or sulfur atom, two AR1s, AR1 and AR2, or two AR2s are optionally bonded; AR3 represents a benzene, naphthalene, thiophene, pyridine, or diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; “p” is 1 or 2; “q” is 1 or 2; “r” is 0 or 1; “s” is 2 to 4; when s=2, Z represents a single bond, divalent atom, or divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group. This compound cures to form an organic film, and also forms an organic under layer film.

  如下通式 (1-1) 所示的化合物、 AR1 和 AR2 各自独立地代表一个芳香环或一个至少含有一个氮原子和/或硫原子的芳香环，两个 AR1、AR1 和 AR2 或两个 AR2 可以选择键合；AR3 代表苯环、萘环、噻吩环、吡啶环或重氮环；A 代表一个有机基团；B 代表阴离子离去基团；Y 代表二价有机基团；"p "为 1 或 2；"q "为 1 或 2；"r "为 0 或 1；"s "为 2 至 4；当 s=2 时，Z 代表单键、二价原子或二价有机基团；当 s=3 或 4 时，Z 代表三价或四价原子或有机基团。这种化合物固化后可形成有机薄膜，也可形成有机底层薄膜。
• Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US11307497B2

  公开（公告）日：2022-04-19

  A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

  在分子中包含两个或两个以上通式（1-1）所示部分结构的化合物、 其中，每个 Ar 独立地代表一个可选具有取代基的芳香环，或一个包含至少一个可选具有取代基的氮原子的芳香环，两个 Ar 可选地相互键合以形成环状结构；断线代表与有机基团的键合；B 代表阴离子离去基团，该离去基团能够在热和酸的作用下形成活性阳离子。这种化合物能够在空气或惰性气体中的成膜条件下固化而不产生副产物，并且在基底加工过程中形成的有机底层膜具有良好的干蚀刻耐久性，同时还具有填充间隙和使基底上形成的图案平面化的优异特性。