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2,2'-lophyl dimer | 6149-36-6

中文名称
——
中文别名
——
英文名称
2,2'-lophyl dimer
英文别名
Hexaphenyl-2,2'-bis-2H-imidazolyl;2,4,5,2',4',5'-hexaphenyl-2H,2'H-[2,2']biimidazolyl;2,2'-Diphenyl-4,4',5,5'-tetraphenyl-biimidazole;2,4,5-triphenyl-2-(2,4,5-triphenylimidazol-2-yl)imidazole
2,2'-lophyl dimer化学式
CAS
6149-36-6
化学式
C42H30N4
mdl
——
分子量
590.727
InChiKey
ALHLRQWXKHIGBF-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    8.3
  • 重原子数:
    46
  • 可旋转键数:
    7
  • 环数:
    8.0
  • sp3杂化的碳原子比例:
    0.05
  • 拓扑面积:
    49.4
  • 氢给体数:
    0
  • 氢受体数:
    4

反应信息

  • 作为产物:
    描述:
    三苯基咪唑基自由基单体 以 为溶剂, 生成 2,2'-lophyl dimer
    参考文献:
    名称:
    Sakaino, Yoshiko, Journal of the Chemical Society. Perkin transactions I, 1983, # 5, p. 1063 - 1066
    摘要:
    DOI:
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文献信息

  • UV-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH BENZOXAZOLE DERIVATIVE AND ANALOGUES THEREOF AS SENSITIZER
    申请人:Strehmel Bernd
    公开号:US20100291355A1
    公开(公告)日:2010-11-18
    Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer, and (iii) at least one coinitiator capable of forming free radicals together with the sensitizer, said coinitiator being other than metallocenes, characterized in that the at least one sensitizer comprises a compound of formula (I) wherein at least one of the groups R 9 to R 12 is a bulky group which has a van der Waals volume of at least 55 Å 3 .
    含有光刻制版前体的石版印刷版,包括(a)具有亲水表面的石版基板和(b)放射敏感涂层,在亲水表面上包括(i)一种或多种单体和/或寡聚物和/或聚合物,每种都包括至少一个对自由基聚合可访问的乙烯基不饱和基团,(ii)至少一种敏化剂,和(iii)至少一种与敏化剂一起能够形成自由基的协同引发剂,所述协同引发剂不是金属茂基化合物,其特征在于至少一种敏化剂包括式(I)中的化合物,其中至少有一组R9到R12是具有至少55Å3的范德华体积的笨重基团。
  • In situ Observation of Molecular Swapping in a Crystal by X-ray Analysis
    作者:Masaki Kawano、Tomokatsu Sano、Jiro Abe、Yuji Ohashi
    DOI:10.1246/cl.2000.1372
    日期:2000.12
    X-ray diffraction analysis elucidated that a pair of hexaarylbiimidazoles was transformed to a complex composed of two lophyl radicals and a piezodimer on irradiation at low temperatures. The piezodimer, the existence of which has been assumed spectroscopically as an unstable isomer, was produced via molecular swapping of two photo-induced lophyl radicals with drastic conformational change. The black crystal reverted to the original structure on warming to 25 °C.
    X 射线衍射分析表明,一对六芳基咪唑在低温辐照下转变为由两个洛菲基和一个压锁二聚体组成的复合物。这种压锁二聚体是通过两个光诱导的洛菲自由基的分子交换而产生的,其构象发生了剧烈的变化,从光谱学上看,它是一种不稳定的异构体。当温度升至 25 °C时,黑色晶体又恢复到原来的结构。
  • Photopolymerisable mixture and recording material prepared therewith
    申请人:AGFA-GEVAERT naamloze vennootschap
    公开号:EP1079276A1
    公开(公告)日:2001-02-28
    The present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a photoreducible dye and a metallocene. This mixture can be used for preparing high-speed light-sensitive recording materials showing a particularly high resolution, especially for small negative types.
    本发明公开了一种可光聚合的混合物,其中包括聚合物粘合剂、含有至少一个可光氧化基团的可辐射光聚合组分、含有 2 个或更多乙二醇单元的聚乙二醇二(甲基)丙烯酸酯、可光还原染料和茂金属。这种混合物可用于制备高速感光记录材料,尤其是用于制备小型底片,能显示出特别高的分辨率。
  • Bakeable radiation-sensitive elements with a high resistance to chemicals
    申请人:Eastman Kodak Company
    公开号:EP1849600A1
    公开(公告)日:2007-10-31
    A singe- or multilayer radiation-sensitive element comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the radiation-sensitive elements that can be negatively or positively working lithographic printing plate precursors.
    一种单层或多层辐射敏感元件包括在基底上的辐射敏感涂层,该涂层由可溶于或分散于碱性水溶液中的共聚物组成,共聚物包括由相应的乙烯不饱和可聚合单体衍生的(甲基)丙烯酸递归单元、亚胺递归单元和酰胺递归单元;共聚物为辐射敏感元件提供了更强的耐化学性,这些辐射敏感元件可以是负工作或正工作的平版印刷板前体。
  • Adhesive detackification
    申请人:3M Innovative Properties Company
    公开号:US20030054138A1
    公开(公告)日:2003-03-20
    The invention describes a method of curing a polymerizable material containing ethylenically unsaturated bonds at a temperature of 60° C. or less, comprising the steps of (a) providing a curative comprising an effective amount of a light-stable isomer of a 2,4,5-triarylimidazolyl dimer, such as bilophine; (b) activating said curative by application of an activator selected from the group consisting of solvent and friction; and (c) combining the activated curative with the polymerizable material. Articles comprising an adhesive having a detackified surface, such as adhesive bandages, a detackifying solution, a two-part adhesive system, and a fastening system are also provided.
    本发明描述了一种在 60℃或更低温度下固化含有乙烯不饱和键的可聚合材料的方法, 包括以下步骤:(a)提供一种包含有效量的 2,4,5-三芳基咪唑二聚体的光稳定异构体的固化剂, 例如比洛芬;(b)通过使用选自溶剂和摩擦的组中的活化剂来活化所述固化剂;以及(c)将活化 的固化剂与可聚合材料结合。 此外,还提供了由具有解包表面的粘合剂(如粘合绷带)、解包溶液、双组份粘合剂系统和紧固系统组成的物品。
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