UV-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH BENZOXAZOLE DERIVATIVE AND ANALOGUES THEREOF AS SENSITIZER
申请人:Strehmel Bernd
公开号:US20100291355A1
公开(公告)日:2010-11-18
Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer, and (iii) at least one coinitiator capable of forming free radicals together with the sensitizer, said coinitiator being other than metallocenes, characterized in that the at least one sensitizer comprises a compound of formula (I) wherein at least one of the groups R
9
to R
12
is a bulky group which has a van der Waals volume of at least 55 Å
3
.
X-ray diffraction analysis elucidated that a pair of hexaarylbiimidazoles was transformed to a complex composed of two lophyl radicals and a piezodimer on irradiation at low temperatures. The piezodimer, the existence of which has been assumed spectroscopically as an unstable isomer, was produced via molecular swapping of two photo-induced lophyl radicals with drastic conformational change. The black crystal reverted to the original structure on warming to 25 °C.
X 射线衍射分析表明,一对六芳基咪唑在低温辐照下转变为由两个洛菲基和一个压锁二聚体组成的复合物。这种压锁二聚体是通过两个光诱导的洛菲自由基的分子交换而产生的,其构象发生了剧烈的变化,从光谱学上看,它是一种不稳定的异构体。当温度升至 25 °C时,黑色晶体又恢复到原来的结构。
Photopolymerisable mixture and recording material prepared therewith
申请人:AGFA-GEVAERT
naamloze vennootschap
公开号:EP1079276A1
公开(公告)日:2001-02-28
The present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a photoreducible dye and a metallocene. This mixture can be used for preparing high-speed light-sensitive recording materials showing a particularly high resolution, especially for small negative types.
Bakeable radiation-sensitive elements with a high resistance to chemicals
申请人:Eastman Kodak Company
公开号:EP1849600A1
公开(公告)日:2007-10-31
A singe- or multilayer radiation-sensitive element comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the radiation-sensitive elements that can be negatively or positively working lithographic printing plate precursors.
The invention describes a method of curing a polymerizable material containing ethylenically unsaturated bonds at a temperature of 60° C. or less, comprising the steps of (a) providing a curative comprising an effective amount of a light-stable isomer of a 2,4,5-triarylimidazolyl dimer, such as bilophine; (b) activating said curative by application of an activator selected from the group consisting of solvent and friction; and (c) combining the activated curative with the polymerizable material.
Articles comprising an adhesive having a detackified surface, such as adhesive bandages, a detackifying solution, a two-part adhesive system, and a fastening system are also provided.