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2-[Iodo(naphthalen-2-yl)methyl]naphthalene | 7468-60-2

中文名称
——
中文别名
——
英文名称
2-[Iodo(naphthalen-2-yl)methyl]naphthalene
英文别名
——
2-[Iodo(naphthalen-2-yl)methyl]naphthalene化学式
CAS
7468-60-2
化学式
C21H15I
mdl
——
分子量
394.2
InChiKey
VRAMYBNCSRSGQL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.9
  • 重原子数:
    22
  • 可旋转键数:
    2
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.05
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    0

文献信息

  • Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US10745372B2
    公开(公告)日:2020-08-18
    A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.
    下式(1)所代表的化合物: 其中每个 X 独立地代表氧原子或硫原子或非交联,R1 代表单键或具有 1 至 30 个碳原子的 2n 价基团,该基团可以具有脂环烃基团、双键、杂原子或具有 6 至 30 个碳原子的芳基,每个 R2 独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、具有 6 至 30 个碳原子的芳氧基或羟基,其中至少一个 R2 代表具有 1 至 30 个碳原子的烷氧基或具有 6 至 30 个碳原子的芳氧基,每个 m 独立地为 1 至 6 的整数,每个 p 独立地为 0 或 1,n 为 1 至 4 的整数。
  • COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20170349564A1
    公开(公告)日:2017-12-07
    A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R 1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R 2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R 2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.
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