Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US10745372B2
公开(公告)日:2020-08-18
A compound represented by the following formula (1):
wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.
下式(1)所代表的化合物:
其中每个 X 独立地代表氧原子或硫原子或非交联,R1 代表单键或具有 1 至 30 个碳原子的 2n 价基团,该基团可以具有脂环烃基团、双键、杂原子或具有 6 至 30 个碳原子的芳基,每个 R2 独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、具有 6 至 30 个碳原子的芳氧基或羟基,其中至少一个 R2 代表具有 1 至 30 个碳原子的烷氧基或具有 6 至 30 个碳原子的芳氧基,每个 m 独立地为 1 至 6 的整数,每个 p 独立地为 0 或 1,n 为 1 至 4 的整数。