4-(Diphenyl-phosphinoyl)-2-hydroxy-1,2-diphenyl-butan-1-one | 22950-47-6

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: 4-(Diphenyl-phosphinoyl)-2-hydroxy-1,2-diphenyl-butan-1-one
• 英文别名: 4-(Diphenylphosphoryl)-2-hydroxy-1,2-diphenylbutan-1-one；4-diphenylphosphoryl-2-hydroxy-1,2-diphenylbutan-1-one
• CAS: 22950-47-6
• 化学式: C₂₈H₂₅O₃P
• 分子量: 440.478
• InChiKey: XSCUGBJYVDEABI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  32
• 可旋转键数：
  8
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  54.4
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
  申请人：Canon Kabushiki Kaisha

  公开号：EP1956429A1

  公开（公告）日：2008-08-13

  A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.

  光敏化合物分子中有两个或多个结构单元，由以下通式（1）表示： 其中 R1 至 R10 选自氢原子、卤素原子、烷基、烷氧基、苯基、萘基和部分或全部氢原子被氟原子取代的烷基组成的组；X 为取代或未取代的亚苯基或取代或未取代的亚萘基。
• PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
  申请人：Ito Toshiki

  公开号：US20080187865A1

  公开（公告）日：2008-08-07

  A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R 1 to R 10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
• BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD
  申请人：Ito Toshiki

  公开号：US20090311637A1

  公开（公告）日：2009-12-17

  A block copolymer that can form selectively a microphase-separated structure under exposure with an ultraviolet exposure device, and a substrate processing method by which a micropattern can be formed at a low cost on the substrate by using the block copolymer. The block copolymer has as a basic skeleton a hydrophobic block that has a repeating structure of a hydrophobic monomer and a hydrophilic block that has a repeating structure of a hydrophilic monomer having a hydrophilic functional group. At least some of the hydrophilic functional groups are covered with a hydrophobic protective group and the hydrophobic protective group, which covers the hydrophilic functional group, is dissociated from the hydrophilic functional group by light irradiation. The substrate processing method uses the block copolymer to form a micropattern on the substrate.
• US7776509B2
  申请人：——

  公开号：US7776509B2

  公开（公告）日：2010-08-17
• US8129087B2
  申请人：——

  公开号：US8129087B2

  公开（公告）日：2012-03-06