Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20030224298A1
公开(公告)日:2003-12-04
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
含有长链烷基环己基基团的磺酰基重氮甲烷化合物是一种新颖且有用的光酸发生剂。包含这些化合物的化学增强型抗蚀组合物适用于微细加工,因为具有许多优点,包括提高分辨率、改善焦点宽度、最小化线宽变化或形状退化,即使在长期PED后也是如此,最小化涂层、显影和剥离后残留的碎屑,并在显影后改善图案轮廓。