Nitrogen-containing organic compound, resist composition and patterning process
申请人:Watanabe Takeru
公开号:US20080102405A1
公开(公告)日:2008-05-01
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.