POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
申请人:SATO Kenichiro
公开号:US20080076849A1
公开(公告)日:2008-03-27
A polybenzoxazole precursor is represented by the following formula (1):
wherein R
1
a to R
4
a, R
1
b to R
4
b, X
1
, Y
1
and m are defined in the specification.