作者:Horst Hillgärtner、Wilhelm P. Neumann、Winfried Schulten、Antonios K. Zarkadis
DOI:10.1016/s0022-328x(00)92576-2
日期:1980.11
Persistent radicals R'2C.MR3(I), R'C.(MR3)2 (II) and RC???(MR3)OMR3 (III), R' mostly Ph but also t-Bu, H, R'2 also 9-fluorenyl or 9-xanthenyl, M Si, Ge, Sn, have been generated from the corresponding CH or CHal compounds or by addition of R3M. to ketones. Radicals I, II and III are investigated by ESR spectroscopy. A temperature-dependent equilibrium has been found between these radicals and
持久性基团R” 2 C ^ 。MR 3(I),R'C 。(MR 3)2(II)和RC ???(MR 3)OMR 3(III)中,R '大多博士而且叔卜,H,R' 2 也9-芴基或9-呫吨基,男Si,Ge,Sn是由相应的CH或CHal化合物或通过添加R 3 M生成的。去酮。自由基I,II和III通过ESR光谱法研究。据研究,在这些自由基和它们的二聚体(IV)之间发现了温度相关的平衡。二聚体IV用酸重排,得到二芳基甲烷。自由基I在80°C时会自动氧化,生成苯并频哪醇衍生物,其自由基再次被氧化,并经历不同的裂解过程。在室温下,然而,二聚体IV是被O攻击2形成通过碎裂金属化二苯甲酮衍生物,其可通过UV光分裂成基团R 3中号。(MSi,Ge,Sn)和氧自由基,这些氧自由基通过介晶作用而高度稳定。