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2,2'-dimethyl-4,4'-benzylidenediphenol | 14032-15-6

中文名称
——
中文别名
——
英文名称
2,2'-dimethyl-4,4'-benzylidenediphenol
英文别名
2,2'-dimethyl-4,4'-benzylidene-di-phenol;4.4'-Dioxy-3.3'-dimethyl-triphenylmethan;2,2'-Dimethyl-4,4'-benzyliden-di-phenol;Di(4-hydroxy-3-methyl-phenyl)phenylmethane;4-[(4-hydroxy-3-methylphenyl)-phenylmethyl]-2-methylphenol
2,2'-dimethyl-4,4'-benzylidenediphenol化学式
CAS
14032-15-6
化学式
C21H20O2
mdl
——
分子量
304.389
InChiKey
PNCYFKUQOKAIEA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    106-108 °C
  • 沸点:
    464.7±40.0 °C(Predicted)
  • 密度:
    1.161±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5.3
  • 重原子数:
    23
  • 可旋转键数:
    3
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

点击查看最新优质反应信息

文献信息

  • Catalytic selective bis-arylation of imines with anisole, phenol, thioanisole and analogues
    作者:Cong-Rong Liu、Man-Bo Li、Cui-Feng Yang、Shi-Kai Tian
    DOI:10.1039/b800066b
    日期:——
    The first highly efficient double Friedel–Crafts reaction of N-tosyl imines with anisole, phenol, thioanisole and analogues has been developed to produce the corresponding symmetric diarylmethanes and triarylmethanes with high regioselectivity in the presence of a catalytic amount of Bi2(SO4)3–TMSCl at room temperature.
    首次开发了一种高效的N-甲苯酰亚胺茴香醚苯酚茴香醚及其类似物的双弗里德尔-克拉夫茨反应,在室温下,使用催化量的Bi2(SO4)3-TMSCl,以高区域选择性制备相应的对称二芳基甲烷和三芳基甲烷
  • Optically active compound and photosensitive resin composition
    申请人:——
    公开号:US20030211421A1
    公开(公告)日:2003-11-13
    A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
    一种光活性化合物与光敏剂结合使用,由以下公式(1)表示: A −[( J ) m −( X-Pro )] n (1) 其中,A代表至少包括一种从烃基和杂环基中选择的疏基的疏单元,J代表连接基团,X-Pro代表由光照可去除的保护基团Pro保护的亲基团,m代表0或1,n代表不少于1的整数。 保护基团Pro可以与光敏剂(特别是光酸发生剂)一起通过光照可去除,也可以是疏保护基团。亲基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性,用于光刻应用,因此,该光活性化合物有利于形成具有高分辨率的图案。
  • NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20190169211A1
    公开(公告)日:2019-06-06
    The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).
    本发明是基于本文中的情况而作出的。本发明的目的是提供:一种四羧酸二酐,可导致聚酰亚胺,作为感光树脂组合物的基树脂,能够形成细微图案并获得高分辨率,同时不损害优异的特性,如机械强度和粘附性;通过使用该四羧酸二酐获得的聚酰亚胺树脂;以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式(1)所示。
  • Room-Temperature Bismuth-Catalyzed Bis-arylation of Carbonyl Compounds with Aryl Ethers and Phenols
    作者:Congrong Liu、Manbo Li
    DOI:10.1002/cjoc.201300522
    日期:2013.10
    Using Bi2(SO4)3 as the catalyst and TMSCl as the additive, a wide variety of aldehydes, ketones, and acetals were smoothly condensed with aryl ethers at room temperature to provide the corresponding diarylmethanes and triarylmethanes selectively in good to excellent yields.
    使用Bi 2(SO 4)3作为催化剂和TMSCl作为添加剂,在室温下将各种醛,酮和乙缩醛与芳基醚平稳缩合,以良好的收率选择性地提供相应的二芳基甲烷和三芳基甲烷
  • [EN] METHOD OF BISPHENOL MANUFACTURE<br/>[FR] PROCÉDÉ DE FABRICATION DE BISPHÉNOL
    申请人:SABIC GLOBAL TECHNOLOGIES BV
    公开号:WO2017100164A1
    公开(公告)日:2017-06-15
    An improved method of manufacture of a bisphenol comprises heating a monohydric phenol to a first temperature sufficient to melt the monohydric phenol; adding a carbonyl compound to 2.0-3.0 molar equivalents, based on the moles of carbonyl compound, of the monohydric phenol in the presence of catalytic amounts of an organosulfonic acid catalyst and a reaction promoter at a second temperature sufficient to maintain unreacted monohydric phenol in a molten state; increasing the temperature to a third temperature higher than the second temperature, and mixing for a time sufficient to produce the bisphenol in a yield of 80 to 100%, based on the amount of carbonyl compound; wherein mineral acids, Lewis acids, and ion exchange resins are not used. The method is applicable to the manufacture of 2,2-bis(3,5-dimethyl-4-hydroxyphenyl)propane, a useful intermediate for the manufacture of bifunctional poly(phenylene ether)s.
    一种改进的双制造方法包括将一种一元加热至足以使其熔化的第一温度;在存在催化量的有机磺酸催化剂和反应促进剂的情况下,向一元中加入2.0-3.0摩尔当量的羰基化合物,基于羰基化合物的摩尔数,在足以保持未反应的一元处于熔化状态的第二温度;将温度提高至高于第二温度的第三温度,并混合一段足以产生双的时间,其收率为80%至100%,基于羰基化合物的数量;其中不使用矿酸、路易斯酸和离子交换树脂。该方法适用于制造2,2-双(3,5-二甲基-4-羟基苯基)丙烷,这是制造双功能聚(苯醚)的有用中间体。
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