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diethyl monoallyl isocyanurate | 96651-02-4

中文名称
——
中文别名
——
英文名称
diethyl monoallyl isocyanurate
英文别名
Diethyl-allyl-isocyanursaeure;1-allyl-3,5-diethyl-[1,3,5]triazinane-2,4,6-trione;1,3-Diethyl-5-prop-2-enyl-1,3,5-triazinane-2,4,6-trione
diethyl monoallyl isocyanurate化学式
CAS
96651-02-4
化学式
C10H15N3O3
mdl
——
分子量
225.247
InChiKey
HLBDABDVGFHHIL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    333.1±21.0 °C(Predicted)
  • 密度:
    1.164±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    0.8
  • 重原子数:
    16
  • 可旋转键数:
    4
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    60.9
  • 氢给体数:
    0
  • 氢受体数:
    3

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    diethyl monoallyl isocyanurate间氯过氧苯甲酸 作用下, 以 氯仿 为溶剂, 反应 85.5h, 以95.8%的产率得到diethyl monoglycidyl isocyanurate
    参考文献:
    名称:
    MONOGLYCIDYL ISOCYANURATE COMPOUND AND PRODUCTION METHOD THEREFOR
    摘要:
    提供了一种新的异氰酸酯化合物,其具有作为取代基的环氧丙烯基与氮原子结合。以下是一种单环氧丙烯基异氰酸酯化合物的化学式(1)、(2)或(3)。其中两个R1均为C2-10烷基基团,两个R2均为C1-5烷基烯基团,两个R3均为C1-2烷基基团,两个R4均为C1-2烷基烯基团,两个R5均为C1-2烷基基团。
    公开号:
    US20190135795A1
  • 作为产物:
    描述:
    溴乙烷monoallyl isocyanuratepotassium carbonate 作用下, 以 N-甲基吡咯烷酮 为溶剂, 反应 5.5h, 以90.6%的产率得到diethyl monoallyl isocyanurate
    参考文献:
    名称:
    MONOGLYCIDYL ISOCYANURATE COMPOUND AND PRODUCTION METHOD THEREFOR
    摘要:
    提供了一种新的异氰酸酯化合物,其具有作为取代基的环氧丙烯基与氮原子结合。以下是一种单环氧丙烯基异氰酸酯化合物的化学式(1)、(2)或(3)。其中两个R1均为C2-10烷基基团,两个R2均为C1-5烷基烯基团,两个R3均为C1-2烷基基团,两个R4均为C1-2烷基烯基团,两个R5均为C1-2烷基基团。
    公开号:
    US20190135795A1
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文献信息

  • NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY
    申请人:Mitsubishi Chemical Corporation
    公开号:EP3780226A1
    公开(公告)日:2021-02-17
    Provided is a nonaqueous electrolyte battery in which not only the generation of a gas during high-temperature storage but also an increase in the battery resistance are inhibited. Also provided is a nonaqueous electrolyte solution containing: a compound represented by the following Formula (A); a cyclic carbonate having an unsaturated carbon-carbon bond; and at least one compound selected from the group consisting of compounds represented by the following Formula (B) or (C). In this nonaqueous electrolyte solution, the content of the cyclic carbonate having an unsaturated carbon-carbon bond with respect to a total amount of the nonaqueous electrolyte solution is in a specific range, and the content of the at least one compound selected from the group consisting of compounds represented by Formula (B) or (C) is in a specific range.         OCN-Q-NCO     (C)
    本发明提供了一种非水电解质电池,它不仅能抑制高温储存期间气体的产生,还能抑制电池电阻的增加。本发明还提供了一种非水电解质溶液,其中含有:由下式(A)代表的化合物;具有不饱和碳碳键的环状碳酸盐;以及至少一种选自由下式(B)或(C)代表的化合物组成的化合物组。在该非水电解质溶液中,具有不饱和碳-碳键的环状碳酸盐的含量占该非水电解质溶液总量的比例在特定范围内,至少一种选自由式(B)或(C)代表的化合物组成的组的化合物的含量在特定范围内。 OCN-Q-NCO (C)
  • Monoglycidyl isocyanurate compound and production method therefor
    申请人:NISSAN CHEMICAL CORPORATION
    公开号:US10676463B2
    公开(公告)日:2020-06-09
    There are provided a novel isocyanurate compound having a glycidyl group as a substituent to be bonded to a nitrogen atom. A monoglycidyl isocyanurate compound of the following Formula (1), (2), or (3). (wherein two R1s are each a C2-10 alkyl group, two R2s are each a C1-5 alkylene group, two R3s are each a C1-2 alkyl group, two R4s are each a C1-2 alkylene group, and two R5s are each a C1-2 alkyl group).
    本发明提供了一种新型异氰脲酸酯化合物,该化合物具有一个缩水甘油基团作为取代基与氮原子键合。如下式(1)、(2)或(3)的单缩水甘油基异氰脲酸酯化合物。 (其中两个 R1 分别为 C2-10 烷基,两个 R2 分别为 C1-5 亚烷基,两个 R3 分别为 C1-2 烷基,两个 R4 分别为 C1-2 亚烷基,两个 R5 分别为 C1-2 烷基)。
  • Adherent silicone coating
    申请人:GENERAL ELECTRIC COMPANY
    公开号:EP0391163B1
    公开(公告)日:1995-03-08
  • RESIST UNDERLAYER FILM FORMING COMPOSITION AND FORMING METHOD OF RESIST PATTERN USING THE SAME
    申请人:Sakamoto Rikimaru
    公开号:US20110059404A1
    公开(公告)日:2011-03-10
    It is an object to provide a resist underlayer film forming composition having a large selection ratio of a dry etching rate, and having a k value and an n value at a short wavelength such as an ArF excimer laser, both of which exhibit desired values. There is provided a resist underlayer film forming composition containing a polymer obtained by reacting at least a tetracarboxylic dianhydride having an alicyclic structure or an aliphatic structure and a diepoxy compound having two epoxy groups with an organic solvent containing an alcohol-based compound having an OH group, and a solvent.
  • US4340710A
    申请人:——
    公开号:US4340710A
    公开(公告)日:1982-07-20
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