[EN] METHODS AND COMPOUNDS FOR PHOTO LEWIS ACID GENERATION AND USES THEREOF<br/>[FR] PROCÉDÉS ET COMPOSÉS POUR LA PHOTOGÉNÉRATION D'ACIDES DE LEWIS ET LEURS UTILISATIONS
申请人:UTI LIMITED PARTNERSHIP
公开号:WO2013142956A1
公开(公告)日:2013-10-03
There are disclosed masked Lewis acids into compounds in which the Lewis acid can be released by exposure of the compound to light, especially ultraviolet light. These compounds can be represented by the following formula (I): ([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I). wherein briefly, E represents boron or aluminium, X is an aryl group and Y is -Ar'EAX,. These compounds are used as catalyst for hydrosilylation reaction, crosslinking of polymers, or ester deprotection reactions as photo Lewis acid generator (PhLAG).
披露了遮蔽的路易斯酸进入化合物中,通过将化合物暴露于光,特别是紫外光,可以释放路易斯酸。这些化合物可以用以下公式(I)表示:([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I)。其中,简要地说,E代表硼或铝,X是一个芳基团,Y是-Ar'EAX。这些化合物作为催化剂用于氢硅化反应、聚合物的交联或作为光路易斯酸发生器(PhLAG)的酯去保护反应。