Ethyl 7-oxabicyclo[2.2.1]heptan-2-ylmethyl carbonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机碳酸及其衍生物
• 英文名称: Ethyl 7-oxabicyclo[2.2.1]heptan-2-ylmethyl carbonate
• 英文别名: ethyl 7-oxabicyclo[2.2.1]heptan-2-ylmethyl carbonate
• 化学式: C₁₀H₁₆O₄
• 分子量: 200.23
• InChiKey: RWMZDXREWMEGHA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160096978A1

  公开（公告）日：2016-04-07

  A composition for forming a coating type BPSG film, containing one or more silicic acid skeletal structures represented by formula (1), one or more phosphoric acid skeletal structures represented by formula (2), one or more boric acid skeletal structures represented by formula (3), and one or more silicon skeletal structures represented by formula (4), wherein the composition contains a coupling between units in formula (4). The composition is capable of forming a BPSG film that has excellent adhesiveness in fine patterning, can be easily wet etched by a removing liquid which does not cause damage to a semiconductor substrate and a coating type organic film or a CVD film mainly consisting of carbon which is required in the patterning process, can maintain the peelability even after dry etching, and can suppress generation of particles by forming it in the coating process.
• US9902875B2
  申请人：——

  公开号：US9902875B2

  公开（公告）日：2018-02-27