N,N,N',N'-Tetrakis(ethoxymethyl)urea | 508220-71-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机碳酸及其衍生物
• 英文名称: N,N,N',N'-Tetrakis(ethoxymethyl)urea
• 英文别名: 1,1,3,3-tetrakis(ethoxymethyl)urea
• CAS: 508220-71-1
• 化学式: C₁₃H₂₈N₂O₅
• 分子量: 292.37
• InChiKey: GOKHTAFUTFEUMV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  20
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  60.5
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743769A1

  公开（公告）日：2014-06-18

  The present invention provides a resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom. wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring; at least one of R2 is a hydroxyl group; n is an integer of 1 to 4; the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different; in the general formula (1), m1 are each independently an integer of 1 to 7; and in the general formula (2), X are each independently an oxygen atom or a sulfur atom, and m2 are each independently an integer of 1 to 6.

  本发明提供了一种含有通式（1）或（2）所代表的化合物的抗蚀剂组合物、一种使用该组合物形成抗蚀剂图案的方法、一种用于该组合物的多酚化合物，以及一种可从该组合物中提取的醇类化合物。 其中 R1 各自独立地为单键或具有 1 至 30 个碳原子的 2n 价烃基，其中烃基可以是环烃基、双键、杂原子或具有 6 至 30 个碳原子的芳香基；R2 各自独立地为氢原子、卤素原子、具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基或羟基，在同一萘环上可以相同或不同；R2中至少有一个是羟基； n是1至4的整数；式（1）和式（2）中重复单元的结构式可以相同或不同；通式（1）中，m1各自独立地是1至7的整数；通式（2）中，X各自独立地是氧原子或硫原子，m2各自独立地是1至6的整数。
• RESIST COMPOSITION
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2911002A1

  公开（公告）日：2015-08-26

  A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.

  本发明的抗蚀剂组合物是一种含有抗蚀剂基料和溶剂的抗蚀剂组合物。光刻胶基料含有特定的立体异构体。光刻胶基料中特定立体异构体的含量为 50%至 100%（按质量计）。
• ALCOHOLIC COMPOUND AND METHOD FOR PRODUCING ALCOHOLIC COMPOUND
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP3051350A2

  公开（公告）日：2016-08-03

  The present invention provides an alcoholic compound represented by the general formula (6) or (7), and a method for producing an alcoholic compound represented by the general formula (6) or (7): wherein X' is a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms; R0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; R' are each independently an alkylene group having 1 to 4 carbon atoms; q are each independently an integer of 1 or larger; and p are each independently an integer of 0 to 5.

  本发明提供一种由通式（6）或（7）代表的醇类化合物，以及一种生产由通式（6）或（7）代表的醇类化合物的方法： 其中，X'是氢原子或具有 1 至 18 个碳原子的单价取代基；R0 各自独立地是具有 1 至 4 个碳原子的烷基或卤素原子，且在同一萘环上可以相同或不同；R'各自独立地是具有 1 至 4 个碳原子的亚烷基；q 各自独立地是 1 或更大的整数；p 各自独立地是 0 至 5 的整数。
• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3118684A1

  公开（公告）日：2017-01-18

  The resist composition according to the present invention contains a compound represented by a specific formula. The compound has high heat resistance attributed to its highly aromatic skeleton, in spite of its low molecular weight, and may be used even under high temperature baking conditions. By virtue of the above configuration, the resist composition according to the present invention is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. That is, the resist composition according to the present invention is useful as an acid amplification type non-polymer based resist material.

  本发明的抗蚀剂组合物含有一种由特定式子表示的化合物。尽管该化合物的分子量较低，但其高芳香族骨架使其具有较高的耐热性，甚至可在高温烘烤条件下使用。根据上述结构，本发明的抗蚀剂组合物具有优异的耐热性，在安全溶剂中的溶解度高，灵敏度高，并能赋予抗蚀剂图案良好的形状。也就是说，本发明的抗蚀剂组合物可用作酸放大型非聚合物抗蚀剂材料。