A filler for substrates which comprises an inorganic substance and a carbodiimide-group-containing organic layer chemically bonded to the surface of the inorganic substance. Examples of the carbodiimide-group-containing organic layer include a layer comprising a carbodiimide-group-containing compound represented by either of the following formulae. Due to the constitution, the filler for substrates can be highly dispersed in a resin for substrates even when added in a high proportion and can give a substrate inhibited from deteriorating in electrical properties, mechanical properties, etc. X1m-Z-A-R1-N=C=Nn-R1-NCO1 X1m-Z-A-R1-N=C=Nn-R1-A-Z-X231
[R1 represents a residue of an isocyanate compound; X1 and X2 each independently represents hydrogen, halogeno, etc.; Z's each independently represents silicon or titanium; A represents an organic group having a valence of 2 or higher containing a bond derived from an isocyanate group; m and 1 each is an integer of 1-3, provided that m+1=4; and n is an integer of 1-100.]
一种用于基底的填料,包括无机物和与无机物表面
化学键合的含碳化二
亚胺基团的有机层。含碳化二
亚胺基团有机层的例子包括由下列式子中任一式子所代表的含碳化二
亚胺基团化合物组成的层。由于这种结构,基材用填料即使以高比例添加,也能高度分散在基材用
树脂中,并能获得电性能、机械性能等性能不会劣化的基材。X1m-Z-A-R1-N=C=Nn-R1-NCO1 X1m-Z-A-R1-N=C=Nn-R1-A-Z-X231
[R1 代表
异氰酸酯化合物的残余物;X1 和 X2 各自独立地代表氢、卤素等;Z's 各自独立地代表
硅或
钛;A 代表价数为 2 或更高的有机基团,其中含有从
异氰酸酯基团衍生的键;m 和 1 各自为 1-3 的整数,条件是 m+1=4 ;n 为 1-100 的整数。]