tert-butyl 4-(2-(4-isopropyl-1-yl)ethyl)piperazine-1-carboxylate

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪烷类
• 英文名称: tert-butyl 4-(2-(4-isopropyl-1-yl)ethyl)piperazine-1-carboxylate
• 英文别名: Tert-butyl 4-pentylpiperazine-1-carboxylate
• 化学式: C₁₄H₂₈N₂O₂
• 分子量: 256.389
• InChiKey: GQKVXXIRVZRTKT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  18
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  32.8
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  tert-butyl 4-(2-(4-isopropyl-1-yl)ethyl)piperazine-1-carboxylate 在 三氟乙酸 作用下， 反应 0.08h， 以96%的产率得到1-(1-戊基)哌嗪
  参考文献：
  名称：

  新型苯并咪唑衍生物作为抗真菌剂的合成与研究

  摘要：

  多种病原性真菌菌株对抗真菌药物的抵抗性的上升和出现导致对新抗真菌药物的需求增加。过去已经研究了具有不同作用机理的多种杂环支架。本文中，我们报道了18种烷基化的单，双和三苯并咪唑衍生物的合成和抗真菌活性，它们对哺乳动物细胞的毒性以及在酵母细胞中诱导活性氧（ROS）的能力。我们的许多双苯并咪唑化合物对所有测试的真菌菌株均表现出中等至出色的抗真菌活性，MIC值为15.6至0.975μg/ mL。发现我们的双苯并咪唑类的真菌活性谱取决于烷基链长。

  DOI：

  10.1016/j.bmc.2016.06.010
• 作为产物：
  描述：

  二碳酸二叔丁酯 在 N,N-二异丙基乙胺 作用下， 以 甲醇 、 乙腈 为溶剂， 反应 60.0h， 生成 tert-butyl 4-(2-(4-isopropyl-1-yl)ethyl)piperazine-1-carboxylate
  参考文献：
  名称：

  新型苯并咪唑衍生物作为抗真菌剂的合成与研究

  摘要：

  多种病原性真菌菌株对抗真菌药物的抵抗性的上升和出现导致对新抗真菌药物的需求增加。过去已经研究了具有不同作用机理的多种杂环支架。本文中，我们报道了18种烷基化的单，双和三苯并咪唑衍生物的合成和抗真菌活性，它们对哺乳动物细胞的毒性以及在酵母细胞中诱导活性氧（ROS）的能力。我们的许多双苯并咪唑化合物对所有测试的真菌菌株均表现出中等至出色的抗真菌活性，MIC值为15.6至0.975μg/ mL。发现我们的双苯并咪唑类的真菌活性谱取决于烷基链长。

  DOI：

  10.1016/j.bmc.2016.06.010

文献信息

• Mitotic Kinesin Inhibitors
  申请人：Bergman Jeffrey M.

  公开号：US20080287414A1

  公开（公告）日：2008-11-20

  The present invention relates to tricyclic pyrazoles according to Formula (I) that are useful for treating cellular proliferative diseases, for treating disorders associated with KSP kinesin activity, and for inhibiting KSP kinesin. The invention also relates to compositions which comprise these compounds, and methods of using them to treat cancer in mammals.

  本发明涉及公式（I）的三环吡唑，其对于治疗细胞增殖性疾病，治疗与KSP肌动蛋白活性相关的疾病以及抑制KSP肌动蛋白具有用处。本发明还涉及包含这些化合物的组合物，以及使用它们治疗哺乳动物癌症的方法。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140045117A1

  公开（公告）日：2014-02-13

  A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.
• ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140234759A1

  公开（公告）日：2014-08-21

  According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R 1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140356771A1

  公开（公告）日：2014-12-04

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20150111154A1

  公开（公告）日：2015-04-23

  There is provided a pattern forming method including: (a) a process of forming a film by resin (P) having a repeating unit (a) having a cyclic structure and a partial structure represented by the following Formula (I), (II-1) or (II-2), and a repeating unit (b) having a group which decomposes by the action of an acid to generates a polar group, and an actinic ray-sensitive or radiation-sensitive resin composition containing compound (B) which generates acid upon irradiation with an actinic ray or radiation; (b) a process of exposing the film; and (c) a process of forming a negative-type pattern by performing development using a developer including an organic solvent, an actinic ray-sensitive or radiation-sensitive resin composition used therefor, a resist film, a method of manufacturing an electronic device, and an electronic device.