A negative working photosensitive silicone ladder polymer (PVSQ) based on polyphenylsilsesquioxane with vinyl groups as a reactive substituents in the side chain, and 2,6-bis(azidobenzylidene)-4-methylcyclohexanone (BA) as a photocrosslinker, has been developed. The monodisperse PVSQ was synthesized by co-polymerization of trichlorophenylsilane and trichloro(vinyl)silane with potassium hydroxide in isobutyl methyl ketone. The PVSQ film showed excellent transparency above 280 nm and high solubility in organic solvents. The photosensitive PVSQ containing 3 wt% of BA showed the sensitivity of 40 mJ cm−2 when it was exposed to 365 nm light (i-line) followed by development with a mixture solution of anisole and xylene at 25 °C. The photosensitive PVSQ film also showed high thermal stability (decomposition temperature: 520 °C) and low dielectric constant (3.2/1 MHz), demonstrating a high potential for application to LSI production.
开发了一种负性光敏有机
硅梯形聚合物(PVSQ),其基于侧链上带有
乙烯基作为反应性取代基的聚苯基倍半
硅氧烷,以及作为光
交联剂的2,6-双(
叠氮基亚苄基)-
4-甲基环己酮(BA)。以
三氯苯基
硅烷、三
氯(
乙烯基)
硅烷与
氢氧化钾在异
丁基甲基酮中共聚合成单分散PVSQ。 PVSQ薄膜在280 nm以上表现出优异的透明度以及在有机溶剂中的高溶解度。含有 3 wt% BA 的光敏 PVSQ 在暴露于 365 nm 光(i 线)并在 25 °C 下用
苯甲醚和二
甲苯的混合溶液显影时显示出 40 mJ cm−2 的灵敏度。光敏PVSQ薄膜还表现出高热稳定性(分解温度:520°C)和低介电常数(3.2/1
MHz),在LSI生产中具有很高的应用潜力。