Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit hafnium silicate on surfaces heated to 300° C. The product film has a very uniform stoichiometry throughout the reactor. Similarly, vapors of diisopropylphosphate react with vapors of lithium bis(ethyldimethylsilyl)amide to deposit lithium phosphate films on substrates heated to 250° C. Supplying the vapors in alternating pulses produces these same compositions with a very uniform distribution of thickness and excellent step coverage.
金属
硅酸盐或
磷酸盐通过热底物上的热分解反应沉积在加热的底物上,反应的气相为烷氧基
硅醇或烷基
磷酸酯以及反应性
金属胺基化合物、烷基或烷氧基化合物。例如,三(叔丁氧基)
硅醇的气相与四(乙基甲基胺基)
铪的气相反应,在加热至300°C的表面上沉积
铪硅酸盐。生成的薄膜在整个反应器中具有非常均匀的
化学计量。同样,二
异丙基磷酸酯的气相与双(乙基二甲基
硅基)胺的气相反应,在加热至250°C的底物上沉积
磷酸锂薄膜。交替脉冲供应气相产生具有非常均匀厚度分布和优异阶梯覆盖的相同组成的薄膜。