申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US10698314B2
公开(公告)日:2020-06-30
A chemically amplified resist composition comprising a quencher containing a quaternary ammonium iodide, dibromoiodide, bromodiiodide or triiodide, and an acid generator exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
一种化学放大抗蚀剂组合物由含有季铵碘化物、二溴碘化物、溴碘化物或三碘化物的淬灭剂和酸发生器组成,具有敏化效果和抑制酸扩散的效果,并能形成具有更高分辨率、更低辐射和 CDU 的图案。