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1-甲基-3-[4-(甲基氨基甲酰氨基)环己基]脲 | 13907-74-9

中文名称
1-甲基-3-[4-(甲基氨基甲酰氨基)环己基]脲
中文别名
——
英文名称
1,1'-Cyclohexane-1,4-diylbis(3-methylurea)
英文别名
1-methyl-3-[4-(methylcarbamoylamino)cyclohexyl]urea
1-甲基-3-[4-(甲基氨基甲酰氨基)环己基]脲化学式
CAS
13907-74-9
化学式
C10H20N4O2
mdl
——
分子量
228.29
InChiKey
AVIOYRMXTIRJRV-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    >300 °C
  • 沸点:
    523.6±30.0 °C(Predicted)
  • 密度:
    1.13±0.1 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    -0.2
  • 重原子数:
    16
  • 可旋转键数:
    2
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.8
  • 拓扑面积:
    82.3
  • 氢给体数:
    4
  • 氢受体数:
    2

文献信息

  • [EN] COMPOUNDS AND METHODS FOR INHIBITING NHE-MEDIATED ANTIPORT IN THE TREATMENT OF DISORDERS ASSOCIATED WITH FLUID RETENTION OR SALT OVERLOAD AND GASTROINTESTINAL TRACT DISORDERS<br/>[FR] COMPOSÉS ET PROCÉDÉS D'INHIBITION D'UN ANTIPORT À MÉDIATION PAR NHE DANS LE TRAITEMENT DE TROUBLES ASSOCIÉS À UNE RÉTENTION DE FLUIDE OU À UNE SURCHARGE DE SEL ET DE TROUBLES DU TRACTUS GASTRO-INTESTINAL
    申请人:ARDELYX INC
    公开号:WO2014029983A1
    公开(公告)日:2014-02-27
    The present disclosure is directed to compounds and methods for the treatment of disorders associated with fluid retention or salt overload, such as heart failure (in particular, congestive heart failure), chronic kidney disease, end-stage renal disease, liver disease, and peroxisome proliferator-activated receptor (PPAR) gamma agonist-induced fluid retention. The present disclosure is also directed to compounds and methods for the treatment of hypertension. The present disclosure is also directed to compounds and methods for the treatment of gastrointestinal tract disorders, including the treatment or reduction of pain associated with gastrointestinal tract disorders.
    本公开涉及化合物和治疗液体潴留或盐过多相关疾病的方法,例如心力衰竭(特别是充血性心力衰竭)、慢性肾脏疾病、晚期肾脏疾病、肝脏疾病和过氧化物酶体增殖物激活受体(PPAR)γ激动剂诱导的液体潴留。本公开还涉及化合物和治疗高血压的方法。本公开还涉及化合物和治疗胃肠道疾病的方法,包括治疗或减轻与胃肠道疾病相关的疼痛。
  • Organic Compounds
    申请人:Fairhurst Robin Alec
    公开号:US20100190784A1
    公开(公告)日:2010-07-29
    A compound of formula (I), or stereoisomers or pharmaceutically acceptable salts thereof, wherein, R 1a , R 1b , R 2a , R 2b , U 1 , U 2 , X 1 , X 2 and L are as defined herein.
    化合物的式子(I),或其立体异构体或药学上可接受的盐,其中,R1a,R1b,R2a,R2b,U1,U2,X1,X2和L的定义如下。
  • Cleaning agent for semiconductor device and cleaning method using the same
    申请人:FUJIFILM Corporation
    公开号:EP2045318A1
    公开(公告)日:2009-04-08
    The present invention provides a cleaning agent for cleaning a semiconductor device having copper wiring on the surface thereof following a chemical mechanical polishing process in a production process of a semiconductor device, including a compound represented by the following formula (I):         X1-L-X2     formula (I) wherein, in formula (I), X1 and X2 each independently represent a monovalent substituent formed by removing one hydrogen atom from a heterocycle containing at least one nitrogen atom, and L represents a divalent linking group; and provides a cleaning method using the cleaning agent.
    本发明提供了一种清洁剂,用于在半导体器件的生产过程中经过化学机械抛光工序后清洁表面有线的半导体器件,包括由下式(I)表示的化合物: X1-L-X2 式(I) 其中,在式(I)中,X1 和 X2 各自独立地代表通过从含有至少一个氮原子的杂环中移除一个氢原子而形成的一价取代基,L 代表二价连接基团;并提供一种使用该清洗剂的清洗方法。
  • STRICTLY SEGMENTED THERMOPLASTIC ELASTOMERS AS BIODEGRADABLE BIOMATERIALS
    申请人:Symo-chem B.V.
    公开号:EP3157978B1
    公开(公告)日:2021-08-11
  • CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME
    申请人:NISHIWAKI Yoshinori
    公开号:US20090088361A1
    公开(公告)日:2009-04-02
    The present invention provides a cleaning agent for cleaning a semiconductor device having copper wiring on the surface thereof following a chemical mechanical polishing process in a production process of a semiconductor device, including a compound represented by the following formula (I): X 1 -L—X 2 formula (I) wherein, in formula (I), X 1 and X 2 each independently represent a monovalent substituent formed by removing one hydrogen atom from a heterocycle containing at least one nitrogen atom, and L represents a divalent linking group; and provides a cleaning method using the cleaning agent.
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