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1,3-diethylthioxanthone | 97458-44-1

中文名称
——
中文别名
——
英文名称
1,3-diethylthioxanthone
英文别名
1,3-Diethyl-9H-thioxanthen-9-one;1,3-diethylthioxanthen-9-one
1,3-diethylthioxanthone化学式
CAS
97458-44-1
化学式
C17H16OS
mdl
MFCD02089377
分子量
268.379
InChiKey
AXJZBGQZEBRRKB-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5.1
  • 重原子数:
    19
  • 可旋转键数:
    2
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.24
  • 拓扑面积:
    42.4
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为反应物:
    描述:
    1,3-diethylthioxanthone高氯酸potassium tert-butylate 作用下, 以 为溶剂, 反应 0.58h, 生成
    参考文献:
    名称:
    Akiyama, Shuzo; Nakatsuji, Shin'ichi; Nakashima, Kenichiro, Journal of the Chemical Society. Perkin transactions I, 1988, p. 3155 - 3162
    摘要:
    DOI:
  • 作为产物:
    描述:
    在 aluminum (III) chloride 作用下, 以 二氯甲烷 为溶剂, 反应 4.0h, 以2.8 g的产率得到1,3-diethylthioxanthone
    参考文献:
    名称:
    3-位取代硫杂蒽酮化合物及其制备方法和光聚合体系应用
    摘要:
    本发明涉及有机功能新材料化学品领域,首次披露了一类新奇的3‑位取代的硫杂蒽酮类新结构化合物,其制备方法,以及含有该类化合物的辐射固化配方材料体系及其应用。这些硫杂蒽酮物质是重要的含烯不饱和体系光聚合过程的光敏引发剂关键精细化学品。
    公开号:
    CN114105943A
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文献信息

  • Acid- and radical-generating agent and method for generating acid and radical
    申请人:FUJIFILM Wako Pure Chemical Corporation
    公开号:US10451967B2
    公开(公告)日:2019-10-22
    It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: wherein n pieces of R1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R2 and R3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R4 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.
    本发明的一个目的是提供一种对波长约为300至450纳米的活性能量射线具有高灵敏度的酸和自由基生成剂,能够发挥高酸生成性能和高自由基生成性能,并具有耐热性;以及一种生成酸和自由基的方法。本发明涉及一种由通式(A)表示的化合物;包括该化合物的酸和自由基生成剂;以及生成酸和自由基的方法:其中n个R1分别独立表示一种烷基基团,该烷基基团可能在链中具有特定的功能基团,或者氢原子可能被卤原子取代;一种烷氧基团,其中氢原子可能被卤原子取代;一种芳基或芳氧基,其中氢原子可能被卤原子,烷基或卤代烷基取代;或一种芳基烷基或芳基氧基,其中氢原子可能被卤原子,烷基或卤代烷基取代;n个R2和R3分别独立表示氢原子,烷基基团或烷氧羰基团;R4到R7分别独立表示氢原子,卤原子,烷基基团,烷氧基团,烯基基团,芳基,烷氧羰基团,二烷基氨基团或硝基;Y表示氧原子,硫原子或羰基;n个Z分别独立表示磺酰基或烷氧基磷酰基;n表示1或2。
  • 一种噻吨酮类化合物的紫外光促进的合成方 法
    申请人:浙江工业大学
    公开号:CN111138411B
    公开(公告)日:2021-06-15
    本发明公开了一种噻吨酮类化合物的紫外光促进的合成方法,以噻吨类化合物为反应底物,空气中的氧气为氧化剂,反应底物在1,2‑二氯乙烷中,常温并在380~385nm紫外光照射条件下进行反应,反应结束后经分离处理得到所述的噻吨酮类化合物。本发明所述的合成方法,以光照反应替代了传统的加热反应,可节约能源;不使用任何催化剂。
  • Sensitized photochemical switching for cholesteric liquid crystal displays
    申请人:Shukla Deepak
    公开号:US20070243342A1
    公开(公告)日:2007-10-18
    The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
  • Sensitized Photochemical Switching for Cholesteric Liquid Crystal Displays
    申请人:Shukla Deepak
    公开号:US20100068418A1
    公开(公告)日:2010-03-18
    The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
  • ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL
    申请人:WAKO PURE CHEMICAL INDUSTRIES, LTD.
    公开号:US20160342084A1
    公开(公告)日:2016-11-24
    It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: wherein n pieces of R 1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R 2 and R 3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R 4 to R 7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.
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