申请人:——
公开号:US20010051729A1
公开(公告)日:2001-12-13
Novel reduction compositions are prepared from an active hydride, an additive, and a Lewis base in a hydrocarbon solvent. Such compositions can provide a superior reducing system for organic substrates.
从活性氢化物、添加剂和路易斯碱在烃溶剂中制备新型还原组合物。这种组合物可以为有机底物提供优越的还原系统。