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N-butyl cyanuric acid | 53015-84-2

中文名称
——
中文别名
——
英文名称
N-butyl cyanuric acid
英文别名
1-Butyl-1,3,5-triazinane-2,4,6-trione
N-butyl cyanuric acid化学式
CAS
53015-84-2
化学式
C7H11N3O3
mdl
——
分子量
185.183
InChiKey
LQZVICGUEQCJCG-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.3
  • 重原子数:
    13
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.57
  • 拓扑面积:
    78.5
  • 氢给体数:
    2
  • 氢受体数:
    3

反应信息

  • 作为反应物:
    描述:
    N-butyl cyanuric acid氘代氯仿 为溶剂, 反应 0.5h, 生成
    参考文献:
    名称:
    氢键合四rosettes螺旋中的手性放大。
    摘要:
    描述了在热力学平衡下氢键合的四孔组件中手性的放大。通过“军士和士兵”实验获得的手性扩增的程度仅取决于组件的结构,并且不依赖于用于形成四rosettes组件的方法。M-和P-非对映异构体螺旋之间的自由能差异(deltaG(o)(M / P))比双玫瑰花结组件高40倍之多。
    DOI:
    10.1002/chem.200501161
  • 作为产物:
    参考文献:
    名称:
    Anticonvulsant Drugs. VII. Some Monosubstituted Isocyanurates1
    摘要:
    DOI:
    10.1021/ja01111a002
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文献信息

  • Epoxy resin composition
    申请人:HITACHI, LTD.
    公开号:EP0138209A2
    公开(公告)日:1985-04-24
    An epoxy resin composition containing as a latent hardener a diaminotriazine-modified imidazole compound and dicyandiamide is improved in the usable life of a solder resist ink composition and can give a solder resist also excellent in resistance to an electroless plating bath.
    一种含有二氨基三嗪改性咪唑化合物和双氰胺作为潜固化剂的环氧树脂组合物,可提高阻焊油墨组合物的使用寿命,并使阻焊油墨对无电解电镀浴的耐受性也非常出色。
  • COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY
    申请人:Nissan Chemical Industries, Ltd.
    公开号:EP1560070A1
    公开(公告)日:2005-08-03
    There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
    本发明提供了一种用于形成防反射涂层的组合物,该组合物对用于制造半导体器件的波长的光具有良好的吸收性,对光的反射具有较高的保护效果,与光刻胶层相比具有较高的干蚀刻率。具体来说,用于形成抗反射涂层的组合物含有一种三嗪三酮化合物、低聚物化合物或聚合物化合物,其氮原子上的取代基为羟烷基结构。
  • USE OF A COMPOSITION INCLUDING A POLYMER AS ADHESIVE
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:EP3235853A1
    公开(公告)日:2017-10-25
    There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
    本发明提供了一种新型聚合物、一种含有该聚合物的组合物以及一种含有该聚合物的新型粘合剂组合物,通过该组合物可以获得具有所需性能的固化薄膜。一种包含式(1)结构单元的聚合物: 其中 Q 为二价基团,R1 为 C1-10 亚烷基、C2-10 烯基或 C2-10 亚炔基、C6-14 芳烯基、C4-10 环亚烷基等,或包含式(6)结构单元的聚合物: 其中 Q4 是烯丙基基团、乙烯基基团、环氧基基团或缩水甘油基基团,R5 是二价有机基团,其主链只含有碳原子或除碳原子外还含有氧原子、氮原子和硫原子中的至少一个;包含该聚合物的组合物;以及包含该聚合物和溶剂的粘合剂组合物。
  • Polymer and composition including same, and adhesive composition
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US10202528B2
    公开(公告)日:2019-02-12
    There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
    本发明提供了一种新型聚合物、一种含有该聚合物的组合物以及一种含有该聚合物的新型粘合剂组合物,通过该组合物可以获得具有所需性能的固化薄膜。一种包含式(1)结构单元的聚合物: 其中 Q 为二价基团,R1 为 C1-10 烯基、C2-10 烯基或 C2-10 烯炔基、C6-14 芳烯基、C4-10 环烯基等,或包含式(6)结构单元的聚合物: 其中 Q4 是烯丙基基团、乙烯基基团、环氧基基团或缩水甘油基基团,R5 是二价有机基团,其主链只含有碳原子或除碳原子外还含有氧原子、氮原子和硫原子中的至少一个;一种包含该聚合物的组合物;以及一种包含该聚合物和溶剂的粘合剂组合物。
  • Application of the Study of Reactivity of Alkaline Salts of Isocyanuric Acid to the Synthesis of Mono- and Trisubstituted Isocyanurates
    作者:Muriel Chiron-Charrier、Paul Caubére
    DOI:10.1080/00397919308013795
    日期:1993.11
    Reactivity of alkaline salts of isocyanuric acid has been studied. It has been established that the nucleophilic substitution is not selective because of the protonic exchanges between salts and substituted derivatives. The synthesis of mono or trisubstituted derivative is due to secondary reactions and to solvent effects. With this study, it has been possible to settle a method to prepare mono and trisubstituted derivatives of isocyanuric acid.
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