3-[diphenyl(3-phenylpropoxy)methyl]-N,N-dimethylaniline | 1220688-53-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 3-[diphenyl(3-phenylpropoxy)methyl]-N,N-dimethylaniline
• CAS: 1220688-53-8
• 化学式: C₃₀H₃₁NO
• 分子量: 421.582
• InChiKey: NCIYKDDRKYWNAB-UHFFFAOYSA-N

物化性质

• 沸点：
  549.9±50.0 °C(Predicted)
• 密度：
  1.088±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7.2
• 重原子数：
  32
• 可旋转键数：
  9
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  12.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  3-[diphenyl(3-phenylpropoxy)methyl]-N,N-dimethylaniline 在 水 作用下， 以 乙腈 为溶剂， 生成 3-苯丙醇
  参考文献：
  名称：

  促进光化学裂解苄基CO键。在光不稳定的羟基保护基设计中的应用。

  摘要：

  通过向传统的三苯甲基（Tr）保护基的芳环的间位引入二甲基氨基，已经开发了一种新的对光不稳定的羟基保护基。

  DOI：

  10.1039/b922021f
• 作为产物：
  描述：

  3-苯丙醇 、 3-(dimethylamino)-α,α-diphenylbenzenemethanol 1-acetate 反应 2.0h， 以94%的产率得到3-[diphenyl(3-phenylpropoxy)methyl]-N,N-dimethylaniline
  参考文献：
  名称：

  促进光化学裂解苄基CO键。在光不稳定的羟基保护基设计中的应用。

  摘要：

  通过向传统的三苯甲基（Tr）保护基的芳环的间位引入二甲基氨基，已经开发了一种新的对光不稳定的羟基保护基。

  DOI：

  10.1039/b922021f

文献信息

• Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
  作者：Lei Zhou、Haishen Yang、Pengfei Wang

  DOI：10.1021/jo200692c

  日期：2011.8.5

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.
• Photochemical Formation and Cleavage of C–N Bond
  作者：Pengfei Wang、Wenya Lu、Dattatray Devalankar、Zhenying Ding

  DOI：10.1021/ol503473c

  日期：2015.1.2

  A new photochemical method of C-N bond formation has been developed. A properly substituted trityl alcohol can cleave the benzylic C-O bond and replace it with a C-N bond which is stable under the irradiation conditions. The C-N bond can then be photochemically cleaved with the same light source when the nitrogen is protonated.
• Facilitated photochemical cleavage of benzylic C–O bond. Application to photolabile hydroxyl-protecting group design
  作者：Pengfei Wang、Lei Zhou、Xin Zhang、Xing Liang

  DOI：10.1039/b922021f

  日期：——

  A new photolabile hydroxyl-protecting group has been developed by introducing a dimethylamino group to the meta position of an aromatic ring of the traditional trityl (Tr) protecting group.

  通过向传统的三苯甲基（Tr）保护基的芳环的间位引入二甲基氨基，已经开发了一种新的对光不稳定的羟基保护基。