RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND
申请人:JSR CORPORATION
公开号:US20180319740A1
公开(公告)日:2018-11-08
A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R
1
represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R
1
represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R
2
represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R
2
and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R
3
represents a second acid-labile group.