Copper--zirconium (2/1) | 12186-13-9

• 分子结构分类: 无机化合物 - 均相金属化合物 - 均相过渡金属化合物
• 英文名称: Copper--zirconium (2/1)
• 英文别名: copper;zirconium
• CAS: 12186-13-9
• 化学式: Cu₂Zr
• 分子量: 218.316
• InChiKey: PNERNBLBPMQDSZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.01
• 重原子数：
  3
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  铜 、 锆 生成 Copper--zirconium (2/1)
  参考文献：
  名称：

  On the amorphous and nanocrystalline Zr–Cu and Zr–Ti co-sputtered thin films

  摘要：

  In the current study, we examined and compared the mixing and vitrification behavior of the Zr-Cu and Zr-Ti binary systems in the form of co-sputtered thin films with or without post-annealing. The co-sputtered Zr-Cu films are all amorphous under various co-sputtering conditions, suggesting the high vitrification tendency. The amorphous Zr-Cu thin film will start to crystallize into nano-crystalline Zr2CU and Zr7Cu10 phases upon long exposure at temperatures above 350 degrees C. On the other hand, it is difficult to form amorphous film with the Zr-Ti system, except at a low sputtering power of 30-50 W The low powers enable the co-sputtered Zr-Ti thin film to exhibit the diffuse hump in the X-ray diffraction. Examination by high resolution transmission electron microscopy reveals numerous fine nano-crystalline phases around 2 nm in the amorphous matrix. Upon exposure at 700 degrees C, the Zr-Ti films transform into crystalline hexagonal close-packed alpha and body-centered cubic beta phases. (C) 2008 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.jallcom.2008.07.188

文献信息

• On the amorphous and nanocrystalline Zr–Cu and Zr–Ti co-sputtered thin films
  作者：C.J. Chen、J.C. Huang、H.S. Chou、Y.H. Lai、L.W. Chang、X.H. Du、J.P. Chu、T.G. Nieh

  DOI：10.1016/j.jallcom.2008.07.188

  日期：2009.8

  In the current study, we examined and compared the mixing and vitrification behavior of the Zr-Cu and Zr-Ti binary systems in the form of co-sputtered thin films with or without post-annealing. The co-sputtered Zr-Cu films are all amorphous under various co-sputtering conditions, suggesting the high vitrification tendency. The amorphous Zr-Cu thin film will start to crystallize into nano-crystalline Zr2CU and Zr7Cu10 phases upon long exposure at temperatures above 350 degrees C. On the other hand, it is difficult to form amorphous film with the Zr-Ti system, except at a low sputtering power of 30-50 W The low powers enable the co-sputtered Zr-Ti thin film to exhibit the diffuse hump in the X-ray diffraction. Examination by high resolution transmission electron microscopy reveals numerous fine nano-crystalline phases around 2 nm in the amorphous matrix. Upon exposure at 700 degrees C, the Zr-Ti films transform into crystalline hexagonal close-packed alpha and body-centered cubic beta phases. (C) 2008 Elsevier B.V. All rights reserved.