2,5-Diazabicyclo[2.2.1]heptane-2,5-diethanol | 473402-23-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪烷类
• 英文名称: 2,5-Diazabicyclo[2.2.1]heptane-2,5-diethanol
• 英文别名: 2-[5-(2-hydroxyethyl)-2,5-diazabicyclo[2.2.1]heptan-2-yl]ethanol
• CAS: 473402-23-2
• 化学式: C₉H₁₈N₂O₂
• 分子量: 186.25
• InChiKey: FVHHUDQOLKIRDY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  46.9
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• Solvents and photoresist compositions for short wavelength imaging
  申请人：Shipley Company, L.L.C.

  公开号：US20030036016A1

  公开（公告）日：2003-02-20

  New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.

  本发明提供了适用于短波长成像的新型光刻胶，特别是波长低于 170 纳米（如 157 纳米）的光刻胶。本发明的抗蚀剂由含氟聚合物、光活性成分和溶剂成分组成。用于本发明光刻胶的优选溶剂可将光刻胶成分保持在溶液中，并包括一种或多种优选的两种或多种（即混合物）溶剂。在本发明特别优选的混合溶剂中，每种混合成分的蒸发速度基本相等，因此抗蚀剂组合物中每种混合成分的浓度基本保持恒定。
• Solvents and photoresists compositions for short wavelength imaging
  申请人：Shipley Company, L.L.C.

  公开号：US20040209188A1

  公开（公告）日：2004-10-21

  New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.
• US6787286B2
  申请人：——

  公开号：US6787286B2

  公开（公告）日：2004-09-07