申请人:Nissan Chemical Industries, Ltd.
公开号:EP1431822A1
公开(公告)日:2004-06-23
The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the final cured film has a low water absorption and excellent alkaline resistance. A positive photosensitive polyimide resin composition characterized by comprising an organic solvent-soluble polyimide having repeating units represented by the formula (1):
(wherein m is an integer of from 3 to 10,000, R1 is a tetravalent organic group, R2 is a bivalent organic group, provided that from 5 to 100 mol% of R2 is a bivalent organic group having fluorine), a polyamic acid and a compound capable of generating an acid by irradiation with light.
本发明提供了一种正性感光树脂组合物,该组合物在用碱性水溶液显影时不会出现薄膜减薄、膨胀或剥离现象,固化后可提供尺寸稳定的图案,其最终固化薄膜具有低吸水性和优异的耐碱性。一种正性光敏聚酰亚胺树脂组合物,其特征在于由具有由式(1)表示的重复单元的有机溶剂溶性聚酰亚胺组成:
(其中 m 为 3 至 10,000 的整数,R1 为四价有机基团,R2 为二价有机基团,条件是 5 至 100 摩尔%的 R2 为含氟的二价有机基团)、聚酰胺酸和一种能通过光照射生成酸的化合物。