3,3-di(2',4'-dihydroxyphenyl)phthalide | 1428447-91-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并呋喃
• 英文名称: 3,3-di(2',4'-dihydroxyphenyl)phthalide
• 英文别名: 3,3-bis(2,4-dihydroxyphenyl)-2-benzofuran-1-one
• CAS: 1428447-91-9
• 化学式: C₂₀H₁₄O₆
• 分子量: 350.328
• InChiKey: OCJHXJHCQCPIND-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  26
• 可旋转键数：
  2
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  107
• 氢给体数：
  4
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  苯酐 、 间苯二酚 在 aluminum (III) chloride 、 sodium chloride 作用下， 反应 0.75h， 以11%的产率得到1,3-二羥蒽醌
  参考文献：
  名称：

  Synthesis of damnacanthal, a naturally occurring 9,10-anthraquinone and its analogues, and its biological evaluation against five cancer cell lines

  摘要：

  Damnacanthal and nordamnacanthal, two naturally occurring 9,10-anthraquinones, and their analogues were synthesized. Cytotoxic activity against five cancer cell lines was evaluated using MTT assay. 2-Bromomethyl-1,3-dimethoxyanthraquinone was found to display the highest activity against all cell lines with IC50 range of 2-8 mu M. Structure-activity relationship (SAR) assessment was considered to rationalise the cytotoxic effect. Bromomethyl group at position C-2 of the anthraquinone was found to be important in exerting cytotoxic activity of this class of compounds. The presence of the flanking methoxyl or hydroxyl groups at C-1 and C-3 also contributes to this activity. Finally, the antioxidant effect of these compounds was evaluated. MTT assay was used to measure the cytotoxicity against different cancer cell lines. Antioxidant activity was measured by FTC and TBA methods. Only two anthraquinones, damnacanthal and nordamnacanthal, were found to be antioxidative.

  DOI：

  10.1007/s00044-012-0197-5

文献信息

• Photoresist underlayer film-forming composition and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2813889A2

  公开（公告）日：2014-12-17

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，一种包含由酚酞、酚红、甲酚酞、甲酚红或百里酚酞递归单元组成的酚醛树脂的组合物用于形成光阻底层膜。底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• Underlayer film-forming composition and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10228621B2

  公开（公告）日：2019-03-12

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，一种包含由酚酞、酚红、甲酚酞、甲酚红或百里酚酞递归单元组成的酚醛树脂的组合物用于形成光阻底层膜。底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140363955A1

  公开（公告）日：2014-12-11

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO 2 substrates.