COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING COMPOUND
申请人:MATSUMURA Nobuji
公开号:US20120100480A1
公开(公告)日:2012-04-26
A compound has a following general formula (1).
R
0
represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R
1
represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R
2
represents a single bond or the like. R
3
represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.