申请人:Ayerst, McKenna & Harrison, Ltd.
公开号:US04105778A1
公开(公告)日:1978-08-08
Compounds of formula 1 ##STR1## in which R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are the same or different selected from the group consisting of hydrogen, halogen, nitro, trifluoromethyl, lower alkyl and lower alkoxy, or R.sup.1 and R.sup.2, R.sup.2 and R.sup.3, or R.sup.3 and R.sup.4 together form a CH.sub.2 CH.sub.2 CH.sub.2 CH.sub.2 chain and R.sup.3 and R.sup.4, R.sup.1 and R.sup.4 and R.sup.1 and R.sup.2, respectively, are as defined above, R.sup.5 is hydrogen, lower alkyl or a radical of formula --Alk--OR.sup.6 wherein Alk is an alkylene selected from the group consisting of CR.sup.7 R.sup.8, CR.sup.7 R.sup.8 CR.sup.9 R.sup.10, CR.sup.7 R.sup.8 CR.sup.9 R.sup.10 CR.sup.11 R.sup.12 and CR.sup.7 R.sup.8 CR.sup.9 R.sup.10 CR.sup.11 R.sup.12 CR.sup.13 R.sup.14 wherein each of R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 is hydrogen or lower alkyl and R.sup.6 is hydrogen or lower alkyl; R.sup.15 is hydrogen or lower alkyl; X is O, S, SO or SO.sub.2 ; Y is O or NR.sup.16 wherein R.sup.16 is hydrogen or lower alkyl, are disclosed. The compounds of formula 1 are useful for treating allergic conditions and for treating microbial infections. Methods for the preparation and use of said compounds are disclosed.
化学式为1的化合物,其中R1、R2、R3和R4选择自氢、卤素、硝基、三氟甲基、低烷基和低烷氧基的群体,可以相同或不同;或者R1和R2、R2和R3、或R3和R4一起形成一个CH2CH2CH2CH2链,而R3和R4、R1和R4以及R1和R2分别如上所定义,R5为氢、低烷基或公式-Alk-OR6的基团,其中Alk是选择自CR7R8、CR7R8CR9R10、CR7R8CR9R10CR11R12和CR7R8CR9R10CR11R12CR13R14的烷基,其中每个R7、R8、R9、R10、R11、R12、R13和R14为氢或低烷基,R6为氢或低烷基;R15为氢或低烷基;X为O、S、SO或SO2;Y为O或NR16,其中R16为氢或低烷基。公式1的化合物可用于治疗过敏症和治疗微生物感染。公开了制备和使用所述化合物的方法。