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N-lithio-N-trimethylsilyl-N',N'-dimethylhydrazine | 13529-75-4

中文名称
——
中文别名
——
英文名称
N-lithio-N-trimethylsilyl-N',N'-dimethylhydrazine
英文别名
[(TMS)NNMe2][Li];N-Lithium-N-trimethylsilyl-N',N'-dimethyl-hydrazin;2-Lithio-2-trimethylsilyl-1,1-dimethyl-hydrazin;Lithium;dimethylamino(trimethylsilyl)azanide;lithium;dimethylamino(trimethylsilyl)azanide
N-lithio-N-trimethylsilyl-N',N'-dimethylhydrazine化学式
CAS
13529-75-4
化学式
C5H15N2Si*Li
mdl
——
分子量
138.214
InChiKey
RJWIHHPEFJEQGL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -1.32
  • 重原子数:
    9
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    4.2
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

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文献信息

  • On the presence or absence of geminal Si⋯N interactions (α-effect) in pentafluorophenylsilyl compounds with SiCN, SiNN and SiON backbones
    作者:Markus Woski、Raphael J. F. Berger、Norbert W. Mitzel
    DOI:10.1039/b808388f
    日期:——
    The silanes C6F5SiF2CH2NMe2 (1), C6F5SiF2N(SiMe3)NMe2 (2) and C6F5SiF2ONMe2 (3) with pentafluorophenyl substituents and geminal N atoms have been prepared by the reaction of C6F5SiF3 with LiCH2NMe2, LiN(SiMe3)NMe2 and LiONMe2, respectively. The compounds have been characterised by spectroscopic methods and crystal structure determination. Comparison of measured and calculated IR spectra has provided insight into the conformational composition of the vapour of 3. Whereas 2 and 3 show interactions between the geminal Si and N atoms, 1 does not. Further analysis of the bonding situation has been undertaken by quantum chemical calculations of the rotation and bending potentials of the C6F5SiF2–X–NMe2 units.
    通过C6F5SiF3分别与LiCH2NMe2、LiN(SiMe3)NMe2和LiONMe2反应制备了带有五氟苯基取代基和偕N原子的硅烷C6F5SiF2CH2NMe2 (1)、C6F5SiF2N(SiMe3)NMe2 (2)和C6F5SiF2ONMe2 (3)。这些化合物已通过光谱方法和晶体结构测定进行了表征。测量和计算的红外光谱的比较提供了对 3 的蒸气构象组成的深入了解。虽然 2 和 3 显示了孪晶 Si 和 N 原子之间的相互作用,但 1 没有。通过对 C6F5SiF2-X-NMe2 单元的旋转和弯曲势的量子化学计算,对键合情况进行了进一步分析。
  • New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe2)3[N(TMS)NMe2] and Ta(NMe2)4[N(TMS)NMe2], and fluxional behavior of the amido and hydrazido ligands in solution
    作者:Shih-Huang Huang、Tero Pilvi、Xiaoping Wang、Markku Leskelä、Michael G. Richmond
    DOI:10.1016/j.poly.2010.02.022
    日期:2010.5
    The synthesis and structural characterization of new tantalum(V) compounds containing a single hydrazido(1) ligand are reported. Hydrazinolysis of TaCl(NMe2)(4) using trimethylsilyl(dimethyl)hydrazine affords the compound TaCl(NMe2)(3)[N(TMS)NMe2] in essentially quantitative yield. Metathetical replacement of the chloride ligand in TaCl(NMe2)(3)]N(TMS)NMe2] by LiNMe2 gives the all-nitrogen coordinated compound Ta(NMe2)(4)[N(TMS)NMe2]. VT H-1 NMR studies support the existence of low-energy pathways involving rotation about the Ta-N bonds of the ancillary amido and hydrazido ligands in both hydrazido-substituted compounds. X-ray crystallographic analyses confirm the octahedral disposition about the tantalum metal in TaCl(NMe2)(3)[N(TMS)NMe2] and Ta(NMe2)(4)[N(TMS)NMe2] and the presence of an mu(2)-hydrazido(1) ligand. Preliminary data using Ta(NMe2)(4)[N(TMS)NMe2] as an ALD precursor for the preparation of tantalum nitride and tantalum oxide thin films are presented. (C) 2010 Elsevier Ltd. All rights reserved.
  • Zur Kenntnis der organosilylsubstituierten Dimethylhydrazine
    作者:U. Wannagat、F. H�fler
    DOI:10.1007/bf00932775
    日期:——
  • Scherer,O.J.; Glaessel,W., Chemische Berichte, 1977, vol. 110, p. 3874 - 3888
    作者:Scherer,O.J.、Glaessel,W.
    DOI:——
    日期:——
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同类化合物

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