The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y.
本发明提供了一种感光
树脂或辐射敏感
树脂组合物,该组合物可提供感光度极佳的抗蚀剂薄膜和 LER 性能极佳的图案,并可在图案形成过程中抑制图案塌陷。此外,本发明还提供了一种光刻胶膜、一种图案形成方法、一种带有光刻胶膜的掩膜坯、一种光掩膜的生产方法和一种电子设备的制造方法,每种方法都使用了该感光或辐射敏感
树脂组合物。本发明一个实施例的感光或辐射敏感
树脂组合物包括
树脂 X,其具有通式(I)表示的重复单元 A、具有可酸化基团的重复单元 B 和选自通式(II)表示的重复单元 c1 及类似物的重复单元 C;化合物 Y,其为碱性化合物或
铵盐化合物,其碱性在光射线或辐射照射时降低;以及光酸发生器 Z,其为化合物 Y 以外的化合物。