The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.
本发明提供了新型二氮基
萘醌
磺酸双
酚衍
生物。更具体地说,本发明涉及包括碱溶性
树脂、光敏化合物和表面活性剂的光敏涂层。制备的光刻膜厚度小于1微米。光敏化合物在
水性碱性溶液中可溶或可膨胀,是一般式(A)中的二氮基
萘醌
磺酸双
酚酯,其中DNQ代表2-二氮基-1-
萘醌-4-磺酰基、2-二氮基-1-
萘醌-5-磺酰基、1-二氮基-2-
萘醌-4-磺酰基基团,R1代表烷基、芳基和取代芳基基团。本发明还提供了一种涂覆和成像光敏组合物的方法。