silsesquioxane | 155881-77-9

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 英文名称: silsesquioxane
• 英文别名: Tetrakis(2-triethoxysilylethyl)silane；tetrakis(2-triethoxysilylethyl)silane
• CAS: 155881-77-9
• 化学式: C₃₂H₇₆O₁₂Si₅
• 分子量: 793.376
• InChiKey: PSYAIOXWGIMXQY-UHFFFAOYSA-N

物化性质

• 沸点：
  607.4±55.0 °C(Predicted)
• 密度：
  0.977±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7.63
• 重原子数：
  49
• 可旋转键数：
  36
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  111
• 氢给体数：
  0
• 氢受体数：
  12

反应信息

• 作为产物：
  描述：

  乙醇 、 (硅烷四基四-2,1-乙二基)四(三氯硅烷) 以 正庚烷 为溶剂， 生成 silsesquioxane
  参考文献：
  名称：

  Characterization of polyfunctional alkoxysilanes using potassium (K+) ionization of desorbed species mass spectrometry

  摘要：

  Potassium ionization of desorbed species (K+IDS) mass spectrometry has been used to characterize polyfunctional alkoxysilanes and the modes of reaction for 'star gel' precursors and simpler tetraalkoxysilanes. Efficient observation of molecular ions enabled by K+IDS can readily establish the purity of molecules such as Si(CH2CH2Si(OEt)(3))(4) and cyclo-(Me(CH2CH2Si(OEt)(3))(4)SiO)(4), and has been highly useful in determining the extent of intramolecular condensation in the star molecules. K+IDS has also established the distributions of polysilicate species and the presence of important reactive intermediates containing SiOOCH groups when Si(OMe)(4) reacts with formic acid.

  DOI：

  10.1016/0022-328x(96)06352-8

文献信息

• PHOSPHORUS-CONTAINING SILSESQUIOXANE DERIVATIVES AS FLAME RETARDANTS
  申请人：Lim Lisa S.

  公开号：US20100113659A1

  公开（公告）日：2010-05-06

  A phosphorus-containing silsesquioxane is represented by the formula [R 1 3 SiO 1/2 ] m [R 2 SiO 3/2 ] n [R 3 SiO 3/2 ] p [(R 4 O) 2 PO(CH 2 ) x SiO 3/2 ] q wherein each of R 1 , R 2 , R 3 , and R 4 independently represents a hydrocarbyl group; x represents an integer of from 1 to 8; m is a positive number less than 1.5; n and q are positive numbers greater than 0 and less than 1; and p is a number greater than or equal to 0 and less than 1. Further, (n+p)/q is in a range of from 0.5 to 99, and (n+p+q)=1. Curable and cured compositions comprising the phosphorus-containing silsesquioxane are disclosed.

  一种含磷的硅氧烷的化学式为[R13SiO1/2]m[R2SiO3/2]n[R3SiO3/2]p[(R4O)2PO(CH2)xSiO3/2]q，其中R1、R2、R3和R4分别独立地表示烃基；x表示1到8的整数；m是小于1.5的正数；n和q是大于0且小于1的正数；p是大于或等于0且小于1的数字。此外，(n+p)/q的范围为0.5到99，且(n+p+q)=1。还公开了包含该含磷硅氧烷的可固化和已固化组合物。
• COMPOSITION FOR OPTICAL MATERIALS
  申请人：Wada Kenji

  公开号：US20110089385A1

  公开（公告）日：2011-04-21

  The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R 1 SiO 1.5 ) x (R 2 SiO 1.5 ) y (wherein R 1 is a polymerizable group, R 2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R 1 groups and R 2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.

  光学材料的组成包括从硅基三元氧烷中获得的聚合物，其表示为平均组成式（1）：（R1SiO1.5）x（R2SiO1.5）y（其中R1是可聚合基团，R2是不可聚合基团，x为2.0至14.0的数字，y为2.0至14.0的数字，前提是x+y=8.0至16.0，R1基团和R2基团可以相同或不同），并且包括至少一个笼状硅基三元氧烷化合物。该组合物适用于光学设备中的防反射膜，具有较小的固化收缩，具有良好的涂层表面状态和优异的耐湿性和附着性，在高温条件下折射率变化小，能够形成低折射率膜。
• Characterization of polyfunctional alkoxysilanes using potassium (K+) ionization of desorbed species mass spectrometry
  作者：Michael J. Michalczyk、William J. Simonsick、Kenneth G. Sharp

  DOI：10.1016/0022-328x(96)06352-8

  日期：1996.8

  Potassium ionization of desorbed species (K+IDS) mass spectrometry has been used to characterize polyfunctional alkoxysilanes and the modes of reaction for 'star gel' precursors and simpler tetraalkoxysilanes. Efficient observation of molecular ions enabled by K+IDS can readily establish the purity of molecules such as Si(CH2CH2Si(OEt)(3))(4) and cyclo-(Me(CH2CH2Si(OEt)(3))(4)SiO)(4), and has been highly useful in determining the extent of intramolecular condensation in the star molecules. K+IDS has also established the distributions of polysilicate species and the presence of important reactive intermediates containing SiOOCH groups when Si(OMe)(4) reacts with formic acid.